A method for fabricating a wave retarder plate from a bulk birefringent metal oxide crystal having a planar major surface oriented with respect to principal crystallographic axes of the bulk crystal such that a plane wave normally incident on the planar major surface propagates in the bulk crystal in a first and a second normal mode having orthogonal polarizations and travelling at velocities of c0/na and c0/nb, respectively, where c0 is the velocity of the plane wave in vacuum, and na is the index of refraction along a first normal mode axis, nb is the index of refraction along a second normal mode axis and nb>na, the method comprising:
- (a) implanting ions into the bulk crystal through the planar surface in a direction perpendicular thereto to form a damage layer at an implantation depth d below the planar major surface of the bulk crystal, the planar major surface and the damage layer defining the wave retarder plate to be formed from the bulk crystal, the implantation depth d being given by the relation d = R λ [ n b ( λ ) - n a ( λ ) ] ,
- where R is the optical retardance of the wave retarder plate being formed and λ is the wavelength of light for which the wave retarder plate is designed;
- and
- (b) chemically etching the damage layer to effect detachment of the wave retarder plate from the bulk crystal.