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US 6,641,465 B2Granted
Polishing method, polishing device, glass substrate for magnetic recording medium, and magnetic recording medium
AssigneeHoya Corporation
InventorTakemi Miyamoto
Life of this patent
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Abstract
There are disclosed a polishing method and a polishing device in which cleaning of a glass substrate surface can be achieved to a high level. A glass substrate (MD substrate 1) in the shape of a circular disc having a circular hole in a center portion is immersed in an abrasive liquid 50 containing free abrasive grains, and an inner peripheral end surface of the glass substrate is polished using the abrasive liquid containing the free abrasive grains by rotating a rotary brush 4 or a polishing pad in contact with the inner peripheral end surface.
Claims6
A polishing device comprising:
- an abrasive liquid container in which an abrasive liquid is contained;
- a rotary support disposed on a bottom of the abrasive liquid container;
- a substrate case detachably mounted on the rotary support for holding a large number of circular discs each having a circular hole in a center portion;
- and
- a rotary brush inserted in the circular holes of the circular discs.
2 more elements
Dependencies are inferred from the claim text.