Fabrication method for correcting member, fabrication method for projection optical system, and exposure apparatus

A fabrication method for a projection optical system for projecting an image of a first surface onto a second surface, the fabrication method comprising:

• a measurement step of measuring residual aberration remaining in the projection optical system;
• a hypothesis step of hypothesizing a corrected surface form to be provided to a correcting member in order to correct the residual aberration in the projection optical system;
• a calculation step of calculating wavefront information of a light beam which passes through each of a plurality of regions on the correcting member having the corrected surface form hypothesized in the hypothesis step;
• and
• an evaluation step of evaluating the aberration remaining in the projection optical system to be provided to the correcting member based on the measurement result in the measurement step and on the wavefront information calculated in the calculation step.

An adjustment method of an exposure apparatus having a projection optical system for projecting a pattern of a mask onto a photosensitive substrate, the adjustment method including:

• a measurement step of measuring remaining aberration in the projection optical system;
• a hypothesis step of hypothesizing, based on predetermined functions, a corrected surface form to be provided to a correcting member;
• a calculation step of calculating wavefront information of a light beam which passes through each of a plurality of regions on the correcting member having the corrected surface form hypothesized in the hypothesis step;
• and
• an evaluation step of evaluating the remaining aberration in the projection optical system when the hypothesized corrected surface form hypothesized in the hypothesis step is provided to the correcting member based on the measurement result in the measurement step and on the wavefront information calculated in the calculation step.