Pattern writing method employing electron beam writing device of variable-shaped vector scan system
AssigneeMitsubishi Denki Kabushiki Kaisha
InventorKoji Tange
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Abstract
A first region of an object (10) to be written corresponding to a shot region (H1) is irradiated with an electron beam (11) for a standard shot period (T1). A pattern (M1) is thereby written in the first region of the object (10) to be written. Next, a second region of the object (10) to be written corresponding to a shot region (H2) is irradiated with the electron beam (11) for a shot period (T2) which is determined according to the shot size of the second region. A pattern (M2) is thereby written in the second region of the object (10) to be written. Owing to the correction of shot period, the finished dimension of the pattern M2 is the same as the designed dimension thereof with respect to the Y direction.
Claims2
A pattern writing method, comprising the steps of:
- (a) irradiating a first region of an object to be written with an electron beam for a first period, to write a first pattern having a first side extending in a first direction, and a second side extending in a second direction;
- and
- (b) to be performed separately from said step (a), irradiating a second region of said object to be written with an electron beam for a second period shorter than said first period, to write a second pattern having a first side overlapping said first side of said first pattern, and a second side extending in said second direction, said second side of said second pattern having a dimension of not more than a predetermined threshold value.
Dependencies are inferred from the claim text.