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US 6,639,227 B1Granted
Apparatus and method for charged particle filtering and ion implantation
AssigneeApplied Materials, Inc.
InventorsHilton Glavish, Causon Ko-Chuan Jen
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Abstract
A charged particle filter provides a curved through path and has both magnetic poles for applying a magnetic field normal to the plane of curvature of the path and electrodes for applying a radial electric field. The filter is used as an energy filter downstream of an accelerator in an ion implanter. The filter can be set to provide a range of energy dispersions, to operate as an achromatic bend, or to reject lower charge state ions.
Claims17
An ion implanter comprising:
- an ion beam generator providing a beam including ions to be implanted in a substrate,
- an accelerator to accelerate the beam with ions to a desired implant energy, and
- an energy filter for removing non-desired ions from the accelerated beam before implantation in a substrate, the filter including a beam channel having a beam entrance and a beam exit, said beam channel defining, between said entrance and said exit, a predetermined curved path, in a plane of curvature, for the accelerated beam,
- electrodes arranged for producing over said curved path an electric field in said plane transverse to said path,
- magnetic poles arranged for producing over said path a magnetic field transverse to said plane, and
- a controller for controlling the strength of said electric field and the strength of said magnetic field to operate the energy filter selectively at least in a first mode with substantially zero magnetic field strength and a selected constant electric field strength, and in a second mode with substantially zero electric field strength and a selected constant magnetic field strength.
3 more elements
Dependencies are inferred from the claim text.