E-beam deposition method and apparatus for providing high purity oxide films
AssigneeTriQuint Technology Holding Co.
InventorUtpal Kumar Chakrabarti
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Abstract
An e-beam deposition method and apparatus uses a metallic target and localized oxygen ambient to produce an oxide film for deposition. A metallic target is first heated, then exposed to a stream of oxide, resulting in the formation of a relatively thin layer of oxide on the metallic target surface. Since the oxide has a higher vapor pressure than the underlying metal, when the target is impinged by an electron-beam current, the oxide will preferentially vaporize and be deflected toward the surface to coated.
Claims6
A method of depositing an oxide film on an exposed device surface, the method comprising the steps of:
- a) providing a device to be processed;
- b) providing a metallic target;
- c) heating said metallic target to a temperature sufficient to cause vaporization;
- d) forming a thin oxide layer on a surface of said heated metallic target;
- e) striking said thin oxide layer with an electron beam current so as to release vaporized oxide from said target;
- and
- f) deflecting said vaporized oxide toward said device provided in step a), wherein said oxide will deposit on the exposed device surface.
Dependencies are inferred from the claim text.