Structure and method for preventing barrier failure
AssigneeXilinx, Inc.
InventorJames Karp
Life of this patent
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Abstract
A structure and method to prevent barrier failure is provided. The present invention replaces a standard titanium-nitride (TiN) barrier metal layer with two separately-formed TiN layers. The two TiN layers provide smaller, mismatched grain boundaries. During subsequent tungsten deposition using WF6, the WF6 finds it difficult to penetrate through the mismatched grain boundaries, thereby minimizing any possibility of “tungsten volcano”. One embodiment includes a native or a grown oxide formed between the two TiN layers, thereby providing yet another diffusion barrier to the WF6 and acting as a glue layer between the two TiN layers. The present invention provides a thin and strong barrier metal layer with minimal barrier failures.
Claims4
A method of forming a tungsten plug comprising:
- depositing a titanium layer in a contact window;
- depositing a first titanium-nitride layer on the titanium layer;
- depositing a second titanium-nitride layer above the first titanium-nitride layer;
- forming an oxide layer between the first titanium-nitride layer and the second titanium-nitride layer;
- and
- depositing a tungsten layer on the second titanium-nitride layer to fill the contact window.
A method of preventing a tungsten volcano in a tungsten plug, the method comprising:
- providing a first barrier metal layer on a first surface, the first barrier metal having a first grain boundary;
- providing a second barrier metal layer between the first barrier metal layer and the tungsten plug, the second barrier metal layer having a second grain boundary, wherein the first and second barrier metal layers are of the same composition, wherein mismatching of the first grain boundary to the second grain boundary minimizes gas diffusion to the first surface;
- and
- forming an oxide layer between the first and second barrier metal layers.
Dependencies are inferred from the claim text.