Positive photoresist composition
AssigneeFuji Photo Film Co., Ltd.
InventorsShiro Tan, Toshiaki Aoai, Toru Fujimori
Life of this patent
Estimating the term…
Abstract
A positive photoresist composition comprises the combination of (a) Resin A obtained from an alkali-soluble resin containing phenolic hydroxyl groups by replacing from 10 to 80% of the phenolic hydroxyl groups each with a group represented by formula (I) and (b) Resin B obtained from an alkali-soluble resin containing phenolic hydroxyl groups by replacing from 10 to 80% of the phenolic hydroxyl groups each with a group represented by formula (II) or (III) or a nonpolymeric dissolution inhibitive compound which has at least one kind of group selected from tertiary alkyl ester groups and tertiary alkyl carbonate groups; wherein R1, W, n, and R4 are as defined in the specification.
Claims8
A positive photoresist composition comprising:
- (a) Resin A obtained from an alkali-soluble resin containing phenolic hydroxyl groups by replacing from 10 to 80% of the phenolic hydroxyl groups each with a group represented by formula (I);
- (b) Resin B obtained from an alkali-soluble resin containing phenolic hydroxyl groups by replacing from 10 to 80% of the phenolic hydroxyl groups each with a group represented by formula (II) or (III);
- (c) a compound which generates an acid upon irradiation with actinic rays or a radiation;
- and
- (d) a solvent,
- wherein R1 represents a substituent selected from alkyl groups having 1 to 4 carbon atoms;
- W represents either an organic residue containing at least one atom selected from oxygen, nitrogen, sulfur, phosphorus, and silicon atoms or an atomic group selected from the group consisting of an amino group, an ammonium group, and a mercapto group;
- n represents a natural number of from 1 to 4;
- and
- R4 represents a linear, branched, or cyclic alkyl group having 1 to 6 carbon atoms.
A positive photoresist composition comprising:
- (a) Resin A obtained from an alkali-soluble resin containing phenolic hydroxyl groups by replacing from 10 to 80% of the phenolic hydroxyl groups each with a group represented by formula (I);
- (b) a nonpolymeric dissolution inhibitive compound which has at least one kind of group selected from tertiary alkyl ester groups and tertiary alkyl carbonate groups, is capable of enhancing solubility in aqueous alkali solutions by the action of an acid and is a compound in which each structure has at least two acid-decomposable groups and the two acid-decomposable groups farthest apart from each other are separated from each other by at least 10 bonding atoms excluding those contained in the acid-decomposable groups, or is a compound in which each structure has at least three acid-decomposable groups and the two acid-decomposable groups farthest apart from each other are separated from each other by at least 9 bonding atoms excluding those contained in the acid-decomposable groups;
- (c) a compound which generates an acid upon irradiation with actinic rays or a radiation;
- (d) a solvent, and
- (e) an organic basic compound,
- wherein R1 represents a substituent selected from alkyl groups having 1 to 4 carbon atoms;
- n represents a natural number of from 1 to 4;
- and W represents a group selected from the group consisting of the following substituents:
- wherein
- R2 represents a hydrogen atom or a substituent selected from the group consisting of a linear, branched, or cyclic alkyl group having 1 to 6 carbon atoms, a linear, branched, or cyclic alkenyl group having 2 to 6 carbon atoms, a substituted or unsubstituted aryl group, and a substituted or unsubstituted aralkyl group;
- R3 represents a hydrogen atom or a substituent selected from the group consisting of a linear, branched, or cyclic alkyl group having 1 to 6 carbon atoms, a linear, branched, or cyclic alkoxy group having 1 to 6 carbon atoms, a halogen atom, a nitro group, an amino group, a hydroxyl group, and a cyano group;
- X represents a halogen atom;
- and m represents a natural number of from 1 to 4.
Dependencies are inferred from the claim text.