Material and method for making an electroconductive pattern

Method of making an electroconductive pattern on a support comprising the steps of:

• providing a material for making an electroconductive pattern, said material comprising a support and a light-exposure differentiable element, wherein said light-exposure differentiable element comprises an outermost layer containing a polyanion and a polymer or copolymer of a substituted or unsubstituted thiophene, and optionally a second layer contiguous with said outermost layer;
• and wherein said outermost layer and/or said optional second layer contains a light-sensitive component capable upon exposure of changing the removability of the exposed parts of said outermost layer relative to the unexposed parts of said outermost layer;
• image-wise exposing said material thereby obtaining a differentiation of the removability, optionally with a developer, of said exposed and said non-exposed areas of said outermost layer;
• processing said material, optionally with said developer, thereby removing areas of said outermost layer;
• and
• optionally treating said material to increase the electroconductivity of said non-removed areas of said outermost layer.

Method of making an electroconductive pattern on a support without a removal step comprising the steps of:

• providing a material for making an electroconductive pattern, said material comprising a support and a light-exposure differentiable element, characterized in that said light-exposure differentiable element comprises an outermost layer containing a polyanion and a polymer or copolymer of a substituted or unsubstituted thiophene having a surface resistivity lower than 106 Ω/square, and optionally a second layer contiguous with said outermost layer;
• and wherein said outermost layer and/or said optional second layer contains an aryl diazosulfonate according to formula (I):
• MO3S—N═N—Ar—L—Ar—N═N—SO3M (I)
• where Ar is a substituted or unsubstituted aryl group, L is a divalent linking group, and M is a cation;
• capable upon exposure of changing the removability of the exposed parts of said outermost layer relative to the unexposed parts of said outermost layer;
• and
• image-wise exposing the material thereby obtaining reduction in the conductivity of the exposed areas relative to non-exposed areas, optionally with a developer.

Method of making an electroconductive pattern on a support comprising the steps of:

• providing a material for making an electroconductive pattern, said material comprising a support and a light-exposure differentiable element, wherein said light-exposure differentiable element comprises an outermost layer containing a polyanion and a polymer or copolymer of a substituted or unsubstituted thiophene, and optionally a second layer contiguous with said outermost layer;
• and wherein said outermost layer and/or said optional second layer contains a light-sensitive component capable upon exposure of changing the removability of the exposed parts of said outermost layer relative to the unexposed parts of said outermost layer, said light-sensitive compound selected from the group consisting of a multidiazonium salt, a resin comprising a diazonium salt and a quinonediazide compound;
• image-wise exposing said material thereby obtaining a differentiation of the removability, optionally with a developer, of said exposed and said non-exposed areas of said outermost layer;
• processing said material, optionally with said developer, thereby removing areas of said outermost layer;
• and
• optionally treating said material to increase the electroconductivity of said non-removed areas of said outermost layer.