Exposure mask and exposure method using the same

A method of fabricating a magnetic head comprising:

• forming a photosensitive resist layer on a surface of a substrate having a thin film element, the thin film element being partially exposed on the surface of the substrate;
• determining a relative position between the substrate and an exposure mask, the exposure mask causing a portion of the photosensitive resist layer in the shape of an air bearing surface pattern to remain by having a light transmission section in the shape of the air bearing surface pattern;
• exposing the photosensitive resist layer on the surface of the substrate through the light transmission section of the exposure mask;
• and
• developing the exposed photosensitive resist layer such that a portion of the photosensitive resist layer having the shape of the air bearing surface pattern remains,
• wherein the exposure mask has an alignment mark provided within the light transmission section, and
• wherein in determining the relative position between the substrate and the exposure mask, the relative position between the substrate and the exposure mask is determined based on a relative position between the thin film element exposed on the surface and the alignment mark.