Plasma processing apparatus with real-time particle filter

A plasma processing device comprising:

• a plasma generation unit for generating plasma by using a cathodic arc discharge;
• first and second magnetic field ducts arranged in a row for transporting the plasma in a direction, one end of the row being connected to said plasma generation unit;
• a processing chamber connected to an other end of the row and having a stage for holding a substrate to be processed;
• said substrate being disposed so as to oppose the transport directions of said plasma generated by said plasma generation unit and transported through said first and second magnetic field ducts into said processing chamber, said first and second magnetic field ducts and said processing chamber being kept in vacuum state;
• said first magnetic field duct being supplied with a predetermined voltage for trapping said plasma into a beam form substantially around a central axis of said first magnetic field duct;
• said second magnetic field duct being supplied with a predetermined voltage for causing the beam of said plasma to swing;
• at least one neutral filter having a predetermined shape and being disposed between said first magnetic field duct and said second magnetic field duct, said at least one neutral filter having a same potential as a potential of said first magnetic field duct, said neutral filter having at least one penetration hole of which a total sectional area is less than 40% of a sectional area of said first magnetic field duct.

A plasma processing device comprising:

• a plasma generation unit for generating plasma by using a cathodic arc discharge;
• first and second magnetic field ducts arranged in a row for transporting the plasma in a direction, one end of the row being connected to said plasma generation unit;
• a processing chamber connected to an other end of the row and having a stage for holding a substrate to be processed;
• said substrate being disposed so as to oppose the transport directions of said plasma generated by said plasma generation unit and transported through said first and second magnetic field ducts into said processing chamber, said first and second magnetic field ducts and said processing chamber being kept in vacuum state;
• said first magnetic field duct being supplied with a predetermined voltage for trapping said plasma into a beam form substantially around a central axis of said first magnetic field duct;
• said second magnetic field duct being supplied with a predetermined voltage for causing the beam of said plasma to swing;
• at least one electric field filter being supplied with a predetermined voltage and being disposed between the second magnetic field duct and said substrate to be processed, said at least one electric filter being kept in such a state as to be electrically insulated from said processing chamber;
• the voltage supplied to said at least one electric field filter comprising a direct current voltage generated by using direct current supply or a direct current supply component generated by using a high frequency supply, and said voltage is set to a value in a range of 50 to 60 V as compared with a ground voltage, said electric field filter having an opening portion for passing at least said transported plasma therethrough, and said opening portion being disposed so as to form a concentric circle with respect to a flow of said transported plasma;
• and
• at least one neutral filter having a predetermined shape and being disposed between said first magnetic field duct and said second magnetic field duct, said neutral filter having a same potential as a potential of said first magnetic field duct, said neutral filter having at least one penetration hole of which a total sectional area is less than 40% of a sectional area of said first magnetic field duct.