US 6,637,273 B2 · Methods and apparatus for measuring stress of membrane regions of segmented microlithographic mask blanks

Abstract

Methods and apparatus are disclosed for accurately measuring stresses in respective membrane regions of segmented mask blanks destined to be made into masks or reticles for use in microlithography. A mask blank is held to a securing plate, e.g., by electrostatic attraction. The mask blank is held such that the struts of the mask blank contact the surface of the securing plate. The securing plate defines an array of through holes that are aligned with individual subfields of the mask blank. A pressure differential is applied across the membrane via the through-holes, causing the membrane regions to bulge. While measuring the pressure, the magnitude of bulge of individual membrane regions is measured using a displacement-measuring device. From data concerning the magnitude of bulge, membrane stress and Young's modulus are determined.

Claims9

Dependent claims

A method for measuring stress in membrane regions of a segmented mask blank defining multiple subfields each having a respective membrane region flanked by struts that separate the subfields from one another, the method comprising:

mounting the mask blank on a securing plate such that the struts contact the securing plate, the securing plate defining an array of through-holes, the array having a pitch substantially equal to the pitch of subfields of the mask blank, the mask blank being situated on the securing plate such that the through-holes are aligned with individual respective subfields of the mask blank;
applying a differential pressure across the respective membrane regions of subfields aligned with respective through-holes;
measuring respective displacements of the membrane regions to which the differential pressure is being applied;
and
from the respective displacements, determining respective values of membrane stress of the membrane regions based on a relationship between the pressure and magnitude of membrane displacement.

2 more elements

An apparatus for measuring stress in membrane regions of a segmented mask blank defining multiple subfields each having a respective membrane region flanked by struts that separate the subfields from one another, the apparatus comprising:

a securing plate defining an array of through-holes, the array having a pitch substantially equal to the pitch of subfields of the mask blank, the securing plate being configured for placing the mask blank thereon such that the struts contact the securing plate and the through-holes are aligned with individual respective subfields of the mask blank;
a power supply connected at least to the securing plate and configured to generate an electrostatic force sufficient to attract the mask blank to the securing plate;
a mechanism for applying a differential pressure across the respective membrane regions of subfields aligned with respective through-holes;
and
a device for measuring respective displacements of the membrane regions to which the differential pressure is being applied.

2 more elements

Dependencies are inferred from the claim text.

Methods and apparatus for measuring stress of membrane regions of segmented microlithographic mask blanks

Life of this patent

Methods and apparatus for measuring stress of membrane regions of segmented microlithographic mask blanks

Life of this patent

Abstract

Claims9