Display device and method of manufacturing the same
AssigneeInternational Business Machines Corporation
InventorsShinji Takasugi, Hideo Iiyori
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AssigneeInternational Business Machines Corporation
InventorsShinji Takasugi, Hideo Iiyori
Estimating the term…
A Thin Film Transistor (TFT) array substrate has a dummy signal line as a short circuit wiring for preventing a short circuit due to electrostatic breakdown between a signal line as an upper layer wiring and a gate line as a lower wiring. The dummy signal line is formed on an outer peripheral area of the TFT array substrate. This dummy signal line has a three-layer structure of a silicon lower layer, an Indium Tin Oxide (ITO) intermediate layer and an aluminum (Al) upper layer, enumerated from the lower layer. Although the silicon layer is formed as one consecutive wiring during formation thereof, the silicon layer is etched simultaneously with the Al layer when the Al layer is subjected to pattern forming, and is electrically disconnected between the gate lines. Since the dummy wiring is disconnected after its formation, a short circuit does not occur between the gate lines even in the case where the dummy wiring and two or more of the gate lines are short-circuited with each other.
A method of manufacturing a display device with a display area having a plurality of sub-pixels disposed in the form of matrix, said method comprising the steps of:
A method of manufacturing a display device with a display area having a plurality of sub-pixels disposed in the form of matrix, said method comprising the steps of:
A display device with a display area constituted of a plurality of sub-pixels disposed in the form of matrix, comprising:
A wiring board, comprising:
A display device with a display area constituted of a plurality of sub-pixels disposed in the form of matrix, comprising:
Dependencies are inferred from the claim text.