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US 6,635,917 B2Granted
Semiconductor processing methods of forming a plurality of capacitors on a substrate, bit line contacts and method of forming bit line contacts
AssigneeMicron Technology, Inc.
InventorWerner Juengling
Life of this patent
Estimating the term…
Abstract
Semiconductor processing methods include forming a plurality of patterned device outlines over a semiconductor substrate, forming electrically insulative partitions or spacers on at least a portion of the patterned device outlines, and forming a plurality of substantially identically shaped devices relative to the patterned device outlines. Individual formed devices are spaced from at least one other of the devices by a distance no more than a width of one of the electrically insulative spacers. In such manner, device pitch is reduced by almost fifty percent. According to one aspect, capacitors are formed which, according to a one embodiment, form part of a dynamic random access memory (DRAM) array.
Claims16
A bit line contact comprising:
- a layer formed on a substrate and including an opening extending through the layer to a node on the substrate;
- a first dielectric sidewall formed in the opening and coating an interior sidewall of the opening;
- a second dielectric sidewall formed in the opening and coating an interior sidewall of the first dielectric layer;
- and
- a conductive plug formed within an interior sidewall of the second dielectric layer and extending through the opening to the node, wherein the first dielectric sidewall is formed of a first material and the second dielectric sidewall is formed of a second material having a lower relative dielectric constant than the first dielectric sidewall.
2 more elements
A bit line contact comprising:
- a layer formed on a substrate and including an opening extending through the layer to a node on the substrate;
- a first dielectric sidewall formed in the opening and coating an interior sidewall of the opening;
- a second dielectric sidewall formed in the opening and coating an interior sidewall of the first dielectric layer;
- and
- a conductive plug formed within an interior sidewall of the second dielectric layer and extending through the opening to the node, wherein the first dielectric sidewall comprises silicon nitride.
2 more elements
A bit line contact comprising:
- a layer formed on a substrate and including an opening extending through the layer to a node on the substrate;
- a first dielectric sidewall formed in the opening and coating an interior sidewall of the opening;
- a second dielectric sidewall formed in the opening and coating an interior sidewall of the first dielectric layer;
- and
- a conductive plug formed within an interior sidewall of the second dielectric layer and extending through the opening to the node, wherein the second dielectric sidewall is thicker than the first dielectric sidewall.
2 more elements
A bit line contact comprising:
- a layer formed on a substrate and including an opening extending through the layer to a node on the substrate;
- a first sidewall formed in the opening and coating an interior sidewall of the opening;
- a second sidewall formed in the opening and coating an interior sidewall of the first layer, the first and second sidewalls cooperating to insulate an interior of the second sidewall from an exterior of the first sidewall;
- and
- a conductive plug formed within an interior sidewall of the second layer and extending through the opening to the node, wherein the first sidewall is formed of a first dielectric material and the second sidewall is formed of a second dielectric material having a lower relative dielectric constant than the first sidewall.
2 more elements
A bit line contact comprising:
- a layer formed on a substrate and including an opening extending through the layer to a node on the substrate;
- a first sidewall formed in the opening and coating an interior sidewall of the opening;
- a second sidewall formed in the opening and coating an interior sidewall of the first layer, the first and second sidewalls cooperating to insulate an interior of the second sidewall from an exterior of the first sidewall;
- and
- a conductive plug formed within an interior sidewall of the second layer and extending through the opening to the node, wherein the first sidewall comprises silicon nitride.
2 more elements
A bit line contact comprising:
- a layer formed on a substrate and including an opening extending through the layer to a node on the substrate;
- a first sidewall formed in the opening and coating an interior sidewall of the opening;
- a second sidewall formed in the opening and coating an interior sidewall of the first layer, the first and second sidewalls cooperating to insulate an interior of the second sidewall from an exterior of the first sidewall;
- and
- a conductive plug formed within an interior sidewall of the second layer and extending through the opening to the node, wherein the second sidewall is thicker than the first sidewall.
2 more elements
A bit line contact comprising:
- a layer formed on a substrate and including an opening extending through the layer to a node on the substrate;
- a first sidewall formed in the opening and coating an interior sidewall of the opening;
- a second sidewall formed in the opening and coating an interior sidewall of the first layer, the first and second sidewalls cooperating to insulate an interior of the second sidewall from an exterior of the first sidewall;
- and
- a conductive plug formed within an interior sidewall of the second layer and extending through the opening to the node, wherein:
- the first sidewall comprises silicon nitride;
- and
- the second sidewall comprises silicon dioxide.
5 more elements
A bit line comprising:
- a layer over a substrate;
- an opening extending through the layer to a node on the substrate;
- a first sidewall having a first thickness formed in the opening coating an interior sidewallof the opening, the first sidewall comprising silicon nitride;
- and
- a second sidewall having a second thickness formed in the opening and coating an interior sidewall of the first sidewall, the second sidewall comprising silicon oxide and the second thickness being greater than the first thickness.
2 more elements
Dependencies are inferred from the claim text.