High transmission, low energy beamline architecture for ion implanter

A method for producing an ion beam, comprising the steps of:

• (a) generating a ribbon ion beam in an ion-source having an elongated extraction aperture, said ribbon ion beam having a cross section with a long dimension;
• (b) providing first magnetic fields parallel to the long dimension and perpendicular to the generated direction of said ribbon ion beam for deflecting said ribbon ion beam in vertical planes perpendicular to the long dimension of said ribbon ion beam cross section and focusing said ribbon ion beam vertically while expanding said ribbon ion beam in a horizontal direction, wherein different ion species in said ribbon ion beam are separated;
• (c) selecting an ion species from the separated ribbon ion beam by passing said ribbon ion beam horizontally through a resolving aperture;
• and
• (d) providing second magnetic fields perpendicular to the movement of said ribbon ion beam for deflecting ions of the selected ion species in said ribbon ion beam in a horizontal plane perpendicular to said second magnetic fields and perpendicular to the movement of said ribbon ion beam so that said ribbon ion beam is deflected parallel to the long dimension of said ribbon ion beam cross section to produce desired ion trajectories of the selected ion species in said ribbon ion beam.

Ion beam apparatus comprising:

• an ion source having an elongated extraction aperture for generating a ribbon ion beam, said ribbon ion beam having a cross section with a long dimension;
• a resolving magnet assembly providing substantially horizontal magnetic fields parallel to the long dimension and perpendicular to the generated direction of said ribbon ion beam for deflecting said ribbon ion beam in vertical planes perpendicular to the long dimension of said ribbon ion beam cross section and focusing said ribbon ion beam vertically while expanding said ribbon ion beam in a horizontal direction so that different ion species in said ribbon ion beam are separated;
• a structure defining a resolving aperture through which said ribbon ion beam passes substantially horizontal for selecting an ion species from the separated ribbon ions beam;
• and
• an angle corrector magnet assembly for providing substantially vertical magnetic fields perpendicular to the movement of said ribbon ion beam for deflecting ions of the selected ion species in said ribbon ion beam in a horizontal plane perpendicular to said vertical magnetic fields and perpendicular to the movement of said ribbon ion beam so that said ribbon ion beam is deflected parallel to the long dimension of said ribbon ion beam cross section to produce desired ion trajectories of the selected ion species in said ribbon ion beam.

Ion beam apparatus comprising:

• an ion source having an elongated extraction aperture for generating a ribbon ion beam, said ribbon ion beam having a cross-section with a long dimension;
• a first magnet assembly providing first magnetic fields oriented parallel to the long dimension of said ribbon ion beam and perpendicular to the generated direction of said ribbon ion beam for deflecting said ribbon ion beam in vertical planes perpendicular to the long dimension of said ribbon ion beam cross section and focusing said ribbon ion beam vertically while expanding said ribbon ion beam in a horizontal direction, wherein different ion species in said ribbon ion beam are separated;
• a structure defining a resolving aperture through which said ribbon ion beam passes substantially horizontal for selecting an ion species from the separated ribbon ion beam;
• and
• a second magnet assembly providing second magnetic fields oriented perpendicular to the long dimension of said ribbon ion beam for deflecting ions of the selected ion species in said ribbon ion beam in a horizontal plane perpendicular to said second magnetic fields and perpendicular to the movement of said ribbon ion beam so that said ribbon ion beam is deflected parallel to the long dimension of said ribbon ion beam cross section to produce desired ion trajectories of the selected ion species in said ribbon ion beam.