Substrate dropping prevention mechanism and substrate inspection device provided therewith
AssigneeNikon Corporation
InventorManabu Komatsu
Life of this patent
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AssigneeNikon Corporation
InventorManabu Komatsu
Estimating the term…
A substrate inspection device for carrying out visual inspection of a front surface and a rear surface of a wafer W is provided with an arm 21 for holding the wafer W on pad mounting sections 21b through suction. The arm 21 is moved by an arm driving mechanism between a substrate conveying position and a substrate inspection position. The arm 21 is a flat plate partially cut away and having a bracelet-shape, while the pad mounting sections 21b are arranged at specified intervals on the surface of the arm 21. Clip members 24 are arranged at specified intervals on the arm 21 so as to prevent the wafer W dropping off from the arm 21. If the arm 21 is moved to the substrate inspection position, the clip members 24 move to a substrate dropping position. If the vacuum suction of the pad mounting sections 21b is impaired, the wafer W would drop off, but instead they come into contact with the clip members 24 and dropping is prevented.
A substrate dropping prevention mechanism fitted to a substrate holding device that is provided with a holding section that holds a substrate by sucking a first surface of the substrate, and a tilting mechanism that tilts said holding section, comprising:
Dependencies are inferred from the claim text.