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AssigneeHitachi, Ltd.
InventorsAkihiro Miyauchi, Lee Chahn, Mitsuru Hasegawa, Mitsuo Hayashibara, Hiroshi Sasaki
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The invention relates to a lithographic apparatus for transferring a fine pattern having a line width less than 10 μm, a lithographic method, a structure for and a method of manufacturing an original master for transfer. The lithographic apparatus comprising an original master on which a pattern is formed within a two-dimensional plane, a slit for filling a medium in the pattern, a medium sump for feeding the medium, a pressure regulating mechanism for adjusting the pressure of the medium filled in the slit, and a lithographic substrate. With this apparatus, the pattern can be batch-transferred, thereby making it possible to easily manufacture electronic parts.
An apparatus for batch-transferring a two-dimensional pattern onto a lithographic substrate, comprising an original master formed therein with a slit defining the pattern, a medium sump for supplying into the slit a medium to be transferred, a pressure regulating mechanism for adjusting a pressure of the medium filled in the slit, and a lithographic substrate.
A lithographic apparatus comprising an original master formed with a slit defining a two-dimensional pattern in a substrate, a medium sump for feeding into the slit a medium to be transferred, a pressure regulating mechanism for adjusting a pressure of the medium filled in the slit, and a lithographic substrate, wherein at least two layers, that is, a first layer and a second layer are formed on a surface of the original master in this order, and the second layer is formed therein with a slit having the same lay-out as that of the slit formed in the first layer and defining the two-dimensional pattern.
A lithographic apparatus comprising an original master formed with a slit defining a two-dimensional pattern in a substrate, a medium sump for feeding into the slit a medium to be transferred, a pressure regulating mechanism for adjusting a pressure of the medium filled in the slit, and a lithographic substrate, wherein the slit is composed of a first slit on a surface side of the original master, and at least one second slit formed in the first slit.
A lithographic apparatus comprising an original master formed with a slit defining a two-dimensional pattern in a substrate, a medium sump for feeding into the slit a medium to be transferred, a pressure regulating mechanism for adjusting a pressure of the medium filled in the slit, and a lithographic substrate, wherein at least two layers, that is, a first layer and a second layer are formed on a surface of the original master in this order, and the medium is fed from the medium sump into a hollow zone formed by removing a part of the second layer, by a capillary effect to be fed into the slit.
Dependencies are inferred from the claim text.