Loading patent…
AssigneeFujitsu Limited
InventorsTomoyuki Okada, Yoshimasa Iiduka, Kazuhiko Takahashi, Masahiko Minemura
Estimating the term…
Provided is a computer 15 for producing corrected pattern data which includes corrected features each obtained by adding auxiliary features (serifs) to the right-angle corners of an original feature to compensate for the photo proximity effect. The computer performs the step of: (S1) inputting an original pattern data; (S2) adding triangle or rectangle serifs to right-angle corners of original features, each serif having a side which is an extension of a first side of a corresponding original feature and another side which is a portion of the side adjacent to the first side; (S3) performing a geometric OR operation on the original feature and the serifs to obtain a synthesized feature; and (S4) decomposing the synthesized feature into basic figures which can be processed in an electron beam exposure apparatus.
A photomask having a corrected pattern, said corrected pattern having an original feature and first and second auxiliary features for said original feature, said first and second auxiliary features being added to both adjacent corners of said original feature, said both adjacent corners being located at both ends of a first side of said original feature,
A photomask having a corrected pattern, said corrected pattern having an original feature and first and second auxiliary features for said original feature, said first and second auxiliary features being added to both adjacent corners of said original feature, said both adjacent corners being located at both ends of a first side of said original feature,
A data processing apparatus equipped with a computer on which a computer program is installed, said computer program causing said computer to produce data of a corrected photomask pattern in order to fabricate a photomask using an electron beam exposure apparatus, said corrected pattern having an original feature and first and second auxiliary features for said original feature in order to compensate for the photo proximity effect, wherein said computer program causes said computer to perform a process comprising:
A method of producing data of a corrected photomask pattern by a computer in order to fabricate a photomask using an electron beam exposure apparatus, said corrected pattern having an original feature and first and second auxiliary features for said original feature in order to compensate for the photo proximity effect, wherein said method comprises:
A data processing apparatus equipped with a computer on which a computer program is installed, said computer program causing said computer to produce data of a corrected photomask pattern in order to fabricate a photomask using an laser beam exposure apparatus, said corrected pattern having an original feature and first and second auxiliary features for said original feature in order to compensate for the photo proximity effect, wherein said computer program causes said computer to perform a process comprising:
A method of producing data of a corrected photomask pattern by a computer in order to fabricate a photomask using an laser beam exposure apparatus, said corrected pattern having an original feature and first and second auxiliary features for said original feature in order to compensate for the photo proximity effect, wherein said method comprises:
A computer program product, comprising:
A computer program product, comprising:
A photomask having a corrected pattern, the corrected pattern having an original feature in the shape of an original corner, the original corner comprising two original sides and an original vertex where the two original sides intersect, and an auxiliary feature for the original corner,
A geometrically reduced photomask representation, the representation comprising information representing shapes, the shapes arranged to form a corrected pattern, the corrected pattern having a shape comprising:
Dependencies are inferred from the claim text.