Single drive system for a bi-directional linear chemical mechanical polishing apparatus

An apparatus for creating bi-directional linear motion within a predetermined area with a portion of a polishing pad corresponding to a processing area used for chemical mechanical polishing of a workpiece using a solution comprising:

• a drive assembly that contains a rotatable shaft;
• a slide member that is moveable within a slide area, the slide member being mechanically coupled to the drive assembly, such that rotation of the rotatable shaft creates bi-linear movement of the slide member;
• and
• wherein the polishing pad is disposed through the slide member, such that bi-linear movement of the slide member creates a corresponding bi-linear movement of the portion of the polishing pad, the bi-linear movement of the portion of the polishing pad being used when chemically mechanically polishing the workpiece.

A drive assembly for providing a path for horizontal linear movement of a portion of a polishing pad within a processing area, the polishing pad being disposed between a supply spool and a receive spool, the drive assembly comprising:

• a driving device that contains a rotatable shaft;
• a single casting of metal, the casting containing openings, the casting further including a horizontal slide area;
• a supply pin, a receive pin, and a plurality of rollers disposed within the openings on the casting, the supply pin and the receive pin capable of having the supply spool and the receive spool respectively attached thereto with the polishing pad being disposed therebetween;
• and
• a horizontal slide member that is horizontally moveable within the horizontal slide area, the horizontal slide member being mechanically coupled to the driving device and capable of being coupled to the polishing pad, such that rotation of the rotatable shaft creates horizontal movement of the slide member and will create the horizontal linear movement of the polishing pad.