Method for cleaning polishing tool, polishing method polishing apparatus

A cleaning method of a polishing tool for cleaning a rotatably held polishing tool having a polishing surface to be cleaned and an outer peripheral surface extending perpendicularly to the polishing surface, the cleaning method, comprising:

• positioning a correction tool for correcting a polishing surface of the polishing tool at a position enabling contact with the polishing surface of the polishing tool,
• positioning a cleaning member having a first facing surface facing at least part of the polishing surface of the polishing tool for forming a first clearance with and between the at least part of the polishing surface and a second facing surface facing the outer peripheral surface of said polishing tool forming a second clearance with and between the outer peripheral surface,
• feeding a cleaning solution to the first clearance to form a first cleaning solution film between the first facing surface and the polishing surface and to the second clearance to form a second cleaning solution film between the second facing surface and the outer peripheral surface, and
• rotating the polishing tool to correct the polishing surface while cleaning at least the polishing surface.

A polishing apparatus comprising:

• a polishing means for flattening a polished object by a rotating polishing tool having a polishing surface to be cleaned and an outer peripheral surface extending perpendicularly to the polishing surface and
• a polishing tool cleaning means for cleaning at least the polishing surface of the polishing tool, wherein
• the polishing tool cleaning means has
• a cleaning member having a first facing surface facing the polishing surface of the polishing tool forming a first clearance between the first facing surface and the polishing surface forming a first film of a cleaning solution with and between the first facing surface and the polishing surface of the rotating polishing tool and a second facing surface facing the outer peripheral surface of the polishing tool forming a second clearance between the second facing surface and the outer peripheral surface a forming a second film of the cleaning solution with and between the second facing surface and the outer peripheral surface of the rotating polishing tool and
• a cleaning solution feeding means for feeding the cleaning solution to the first clearance and the second clearance.