High-frequency electrostatically shielded toroidal plasma and radical source
AssigneeApplied Materials, Inc.
InventorsHiroji Hanawa, Kenneth S. Collins, John R. Trow, David Stover, Fernando Silveira
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Abstract
An electrostatically shielded toroidal plasma and radical source is provided. The plasma source includes a grounded metallic plasma source chamber that defines an interior for plasma generation. The plasma source chamber is configured from two L-shaped portions arranged to form rectangularly shaped enclosure. Dielectric breaks are defined by gaps between the two L-shaped portions. A drive inductor is configured such that the metallic plasma source chamber is positioned between loops of the drive inductor.
Claims19
A toroidal plasma source comprising:
- (a) a metallic plasma source chamber defining an interior for plasma generation, the plasma source chamber including at least one dielectric break;
- (b) a drive inductor configured such that the metallic plasma source chamber is positioned between loops of the drive inductor;
- and
- (c) an input coil configured proximate the drive inductor to provide a mutual inductance between the input coil and the drive inductor.
A toroidal plasma source comprising:
- (a) a grounded metallic plasma source chamber defining an interior for plasma generation, the plasma source chamber including two L-shaped aluminum portions assembled to form a rectangularly shaped enclosure;
- (b) a quartz liner configured to line the interior of the plasma source chamber;
- (c) a drive inductor configured such that the metallic plasma source chamber is positioned between loops of the drive inductor;
- (d) an input coil configured proximate the drive inductor to provide a mutual inductance between the input coil and the drive inductor;
- and
- (e) an RF power source capacitively coupled with the drive inductor.
A substrate processing system comprising:
- (a) a process chamber;
- (b) a substrate support within the process chamber and disposed to hold a substrate;
- and
- (c) a toroidal plasma source configured to provide plasma to the process chamber, the toroidal plasma source including:
- (i) a metallic plasma source chamber commonly grounded with the process chamber, the plasma source chamber defining an interior for plasma generation and including at least one dielectric break;
- (ii) a drive inductor configured such that the metallic plasma source chamber is positioned between loops of the drive inductor;
- and
- (iii) an input coil configured proximate the drive inductor to provide a mutual inductance between the input coil and the drive inductor.
Dependencies are inferred from the claim text.