Method and device for optically examining structured surfaces of objects
AssigneeLeica Microsystems Semiconductor GmbH
InventorsMichael Veith, Volker Knorz, Edgar Maehringer-Kunz
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AssigneeLeica Microsystems Semiconductor GmbH
InventorsMichael Veith, Volker Knorz, Edgar Maehringer-Kunz
Estimating the term…
A method and an apparatus are described for the optical examination of structured surfaces of objects, especially of wafers and/or masks. The optical apparatus has an observation beam path (6) whose central axis (42) is directed vertically against the surface of the object (16), an illumination beam (2) whose central ray (40) falls vertically on the surface of the object, and an illumination beam (3) whose central ray (41) falls obliquely onto the surface of the object (16). In the observation beam path (6) the image of the surface of the object (6) is observed and/or detected. In the observation beam path (6) a filter device (38) and/or detector device (18) is disposed. The optical system has an illumination device (39) for the simultaneous production of a dark field illumination, a device for the coding (11) of the illumination beams (2, 3) being associated with the bright field (2) and/or the dark field illumination beam (3).
An apparatus for microscopic optical examination of a structured surface of an object, said apparatus comprising:
Dependencies are inferred from the claim text.