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US 6,633,366 B2Granted
Lithographic apparatus, device manufacturing method, and device manufactured thereby
OwnerPieter Willem Herman de Jager, Pieter Kruit +2inventors
InventorsPieter Willem Herman de Jager, Pieter Kruit, Arno Jan Bleeker, Karel Diederick van der Mast
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Abstract
Various options for improving throughput in an e-beam lithography apparatus are described. A slider lens moves in synchronism with the scanning motion of the electron beam.
Claims49
A lithographic projection apparatus comprising:
- a radiation system to provide a projection beam of radiation;
- a support structure to support patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern;
- a substrate table to hold a substrate;
- a projection system to project the patterned beam onto a target portion of the substrate;
- and
- a sliding electron-optical element to generate an electromagnetic field to displace an optical axis of said projection beam in at least one direction perpendicular to said axis in synchronism with a scanning action of the projection apparatus, said sliding electron-optical element comprising a portion of at least one of said radiation system and said projection system.
3 more elements
A lithographic projection apparatus for imaging a mask pattern in a mask onto a substrate, the apparatus comprising:
- an illumination system constructed and arranged to supply a projection beam of charged particles;
- a first object table provided with a first object holder constructed to hold a mask;
- a second object table provided with a second object holder constructed to hold a substrate;
- and
- a projection system constructed and arranged to image an irradiated portion of the mask onto a target portion of the substrate;
- a magnetic field generator operable to produce a magnetic field in the vicinity of the source of said charged particle beam to impart an angular velocity component to off-axis charged particles emitted from said source.
3 more elements
A lithographic projection apparatus for imaging a mask pattern in a mask onto a substrate, the apparatus comprising:
- an illumination system constructed and arranged to supply a projection beam of charged particles;
- a first object table provided with a first object holder constructed to hold a mask;
- a second object table provided with a second object holder constructed to hold a substrate;
- a projection system constructed and arranged to image an irradiated portion of the mask onto a target portion of the substrate;
- and
- a portion of the projection system comprising four quadrupole lenses comprising an asymmetric doublet.
3 more elements
A lithographic projection apparatus for imaging a mask pattern in a mask onto a substrate, the apparatus comprising:
- an illumination system constructed and arranged to supply a projection beam of charged particles;
- a first object table provided with a first object holder constructed to hold a mask;
- a second object table provided with a second object holder constructed to hold a substrate;
- a projection system constructed and arranged to image an irradiated portion of the mask onto a target portion of the substrate;
- and
- a portion of the projection system comprising six quadrupole lenses forming two triplets.
3 more elements
A lithographic projection apparatus for imaging a mask pattern in a mask onto a substrate, the apparatus comprising:
- an illumination system constructed and arranged to supply a projection beam of charged particles;
- a first object table provided with a first object holder constructed to hold a mask;
- a second object table provided with a second object holder constructed to hold a substrate;
- and
- a projection system constructed and arranged to image an irradiated portion of the mask onto a target portion of the substrate;
- and
- a magnetic field generator comprising a portion of the projection system, said magnetic field generator constructed and arranged to produce a magnetic field proximate the mask, the substrate and a beam path from mask to substrate, said magnetic field being substantially parallel to said beam path and increasing in strength from said mask to said substrate.
4 more elements
A lithographic projection apparatus for imaging a mask pattern in a mask onto a substrate, the apparatus comprising:
- an illumination system constructed and arranged to supply a projection beam of charged particles;
- a first object table provided with a first object holder constructed to hold a mask,
- a second object table provided with a second object holder constructed to hold a substrate;
- and
- a projection system constructed and arranged to image an irradiated portion of the mask onto a target portion of the substrate;
- and
- at least two electromagnets, comprising a portion of the projection system, wherein an electromagnet of the at least two electromagnets nearest the mask and an electromagnet of the at least two electromagnets nearest the substrate have no pole pieces adjacent the mask and substrate respectively.
4 more elements
A lithographic projection apparatus for imaging a mask pattern in a mask onto a substrate, the apparatus comprising:
- an illumination system constructed and arranged to supply a projection beam of charged particles;
- a first object table provided with a first object holder constructed to hold a mask;
- a second object table provided with a second object holder constructed to hold a substrate;
- and
- a projection system constructed and arranged to image an irradiated portion of the mask onto a target portion of the substrate,
- wherein said projection system has a length of less than about 350 mm.
3 more elements
A lithographic projection apparatus for imaging a mask pattern in a mask onto a substrate, the apparatus comprising:
- an illumination system constructed and arranged to supply a projection beam of charged particles;
- a first object table provided with a first object holder constructed to hold a mask;
- a second object table provided with a second object holder constructed to hold a substrate;
- a projection system constructed and arranged to image an irradiated portion of the mask onto a target portion of the substrate;
- an electromagnetic system comprising a portion of said projection system, said electromagnetic system operable to act as imaging lenses;
- and
- an electrostatic system comprising a portion of said projection system to vary the beam energy in the projection system.
4 more elements
A device manufacturing method using a lithography apparatus comprising:
- providing a mask containing a pattern to a first object holder;
- providing a substrate which is at least partially covered by a layer of energy-sensitive material to a second object holder;
- irradiating portions of the mask and imaging said irradiated portions of said mask onto said target portions of said substrate with a projection beam of radiation;
- and
- generating an electromagnetic field to act on the projection beam such that an optical axis of said electromagnetic field is displaced in at least one direction perpendicular to said axis in synchronism with a scanning motion of the lithography apparatus.
2 more elements
Dependencies are inferred from the claim text.