Projection exposure apparatus
AssigneeCanon Kabushiki Kaisha
InventorsEiichi Murakami, Osamu Kakuchi
Life of this patent
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Abstract
A projection exposure apparatus includes an illumination optical system for illuminating a pattern formed on a first object, with light, a projection optical system for projecting the pattern of the first object, illuminated by the illumination optical system, onto a second object for exposure of the same with the pattern, a main system including the illumination optical system and the projection optical system, and an interferometer for use in measurement of an optical characteristic of the projection optical system and being mounted on the main system.
Claims21
A projection exposure apparatus, comprising:
- an illumination optical system for illuminating a pattern formed on a first object, with exposure light from a light source;
- a projection optical system for directing the exposure light, as emitted from the pattern, onto a second object;
- and
- an interferometer for measuring an optical characteristic of said projection optical system, said interferometer including a detection optical system for directing light, for interference, to said projection optical system, wherein said detection optical system has an objective lens which is movable between an inside and an outside of a light path for the exposure light.
A projection exposure apparatus, comprising:
- an illumination optical system for illuminating a pattern of a first object with exposure light from a light source;
- a projection optical system for directing the exposure light, as emitted from the pattern, to a second object;
- a TTR alignment optical system for performing alignment of the first and second objects, said TTR alignment optical system including an objective lens;
- and
- an interferometer having a reference surface, said interferometer being arranged to cause interference between first light passed through said objective lens and said projection optical system and second light reflected by the reference surface, thereby to measure an optical characteristic of said projection optical system on the basis of the produced interference.
A projection exposure apparatus, comprising:
- an illumination optical system for illuminating a pattern of a first object with exposure light from a light source;
- a projection optical system for directing the exposure light, as emitted from the pattern, to a second object;
- a TTR alignment optical system for performing alignment of the first and second objects, said TTR alignment system including an objective lens;
- and
- an interferometer having a reference surface, said interferometer being arranged to cause interference between first light passed through said objective lens and said projection optical system and second light reflected by the reference surface, thereby to measure an optical characteristic of said projection optical system on the basis of the produced interference,
- wherein said objective lens is movable between an inside and an outside of a light path for the exposure light.
Dependencies are inferred from the claim text.