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US 6,633,045 B1Granted
Assembly part with wiring and for manufacturing system, method of manufacturing such assembly part, and semiconductor manufacturing system constituted using assembly part
AssigneeKabushiki Kaisha Toshiba
InventorsKazuyoshi Sugihara, Atsushi Ando, Katsuya Okumura
Life of this patent
Estimating the term…
Abstract
An assembly part for constituting a unit in a vacuum column is provided with wirings and wiring terminals. Each wiring is provided on a first insulating film, and is covered with a second insulating film made of an electro-deposited polyimide film. The assembly part is used to constitute a semiconductor manufacturing system such as an electron beam exposure system.
Claims18
An assembly part for a manufacturing system, comprising:
- a body on which a unit is assembled in a vacuum column;
- a first insulating film provided on the body;
- a wiring arranged on the first insulating film;
- a wiring terminal provided at the wiring in a position for direct connection to another assembly part;
- and
- a second insulating film covering the wiring except for the wiring terminals.
3 more elements
A semiconductor manufacturing system comprising:
- a vacuum column and
- a unit constituted by an assembly part assembled in the vacuum column, wherein the assembly part includes:
- a body;
- a first insulating film provided on the body;
- a wiring provided on the first insulating film;
- a wiring terminal provided at the wiring in a position for direct connection to another assembly part;
- and a second insulating film covering the wiring except for the wiring terminal.
4 more elements
An electron beam exposure system comprising:
- a vacuum column;
- at least a unit such as an electronic lens, a deflector or an electro-optical component housed in the vacuum column;
- a first insulating film provided on the unit;
- a wiring provided on the first insulating film;
- a wiring terminal provided at the wiring in a position for direct connection to another unit;
- and
- a second insulating film covering the wiring except for the wiring terminal.
4 more elements
An electron beam exposure system comprising:
- a vacuum column;
- an electromagnetic lens and an electrostatic deflector housed in the vacuum column;
- a lens stand for holding the electromagnetic lens thereon;
- a deflector stand for holding the electrostatic deflector;
- a first wiring provided on the electromagnetic lens via a first insulating film and including a first wiring terminal;
- a second wiring provided on the lens stand via the first insulating film, and including a second wiring terminal formed in a position for direct connection to the electromagnetic lens and electrically connected to the first wiring terminal;
- a third wiring provided on the electrostatic deflector via the first insulating film and including a third wiring terminal;
- and
- a fourth wiring provided on the deflector stand via the first insulating film, and including a fourth wiring terminal formed in a position for direct connection to the electrostatic deflector and electrically connected to the third wiring terminal.
6 more elements
Dependencies are inferred from the claim text.