Bicyclic aromatic compounds and pharmaceutical/cosmetic compositions comprised thereof
AssigneeGalderma Research & Development, S.N.C.
InventorJean-Michel Bernardon
Life of this patent
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Abstract
Novel pharmaceutically/cosmetically-active bicyclic aromatic compounds have the structural formula (I): in which Ar1 is a radical having one of the structural formulae (a)-(c): Ar2 is a radical having one of the following formulae (d)-(h): and X is a radical having one of the following formulae (i)-(l): and are useful for the treatment of a wide variety of disease states, whether human or veterinary, for example dermatological, rheumatic, respiratory, cardiovascular and ophthalmological disorders, as well as for the treatment of mammalian skin and hair conditions/disorders.
Claims56
A bicyclic aromatic compound having the structural formula (I):
- in which R1 is (i) the radical —CH3, (ii) a radical —CH2OR2, or (iii) a radical —CO—R3, wherein R2 and R3 are as defined below;
- Ar1 is a radical selected from among those of the following formulae (a)-(c):
- wherein R4, R5, R6, R7, R8, R9, R10 and R11 are as defined below;
- Ar2 is a radical selected from among those of the following formulae (d)-(h):
- wherein R12 and R13 are as defined below;
- X is a radical selected from among those of the following formulae (i)-(l):
- wherein R14, R15 and Y are as defined below;
- R2 is a hydrogen atom, a lower alkyl radical or a radical —CO—R16, wherein R16 is as defined below;
- R3 is a hydrogen atom, a lower alkyl radical, a radical of the formula:
- wherein R′ and R″ are as defined below, or a radical —OR17, wherein R17 is as defined below;
- R4 is a hydrogen atom, a polyether radical, a lower alkyl radical, or a radical —OR18, wherein R18 is as defined below;
- R5 is a hydrogen atom, a lower alkyl radical, a polyether radical, or a radical —OR19, wherein R19 is as defined below;
- R6 is a tert-butyl radical;
- R7 is a lower alkyl radical, a polyether radical, or a radical —OR20, wherein R20 is as defined below, with the proviso that R6 and R7 may together form, with the carbon atoms from which they depend, a 6-membered ring optionally substituted with at least one methyl group and/or optionally interrupted by an oxygen or sulfur atom;
- R8 is a tert-butyl, adamantyl, aryl or aralkyl radical;
- R9 and R10 together form, with the carbon atoms from which they depend, a 5- or 6-membered ring optionally substituted with at least one methyl group and/or optionally interrupted by an oxygen or sulfur atom;
- R11 is a hydrogen atom, a lower alkyl radical having from 1 to 9 carbon atoms, a hydroxyl radical, an alkoxy radical, a polyether radical or a radical —OR21, wherein R21 is as defined below;
- R12 is a hydrogen atom, a hydroxyl radical, an alkoxy radical, a polyether radical or a radical —OR22, wherein R22 is as defined below;
- R13 is a hydrogen atom, a lower alkyl radical, or a radical —COR23, wherein R23 is as defined below;
- R14 and R15, which may be identical or different, are each a hydrogen atom, or a lower alkyl radical;
- Y is an oxygen atom or a CH2 radical;
- R16 is a lower alkyl radical;
- R17 is a hydrogen atom, a linear or branched alkyl radical having from 1 to 20 carbon atoms, an alkenyl radical, a mono- or polyhydroxyalkyl radical, an optionally substituted aryl or aralkyl radical or a sugar residue;
- R′ and R″, which may be identical or different, are each a hydrogen atom, a lower alkyl radical, a mono- or polyhydroxyalkyl radical, an optionally substituted aryl radical or an amino acid residue, with the proviso that R′ and R″ may together form, with the nitrogen atom from which they depend, a nitrogenous heterocycle;
- R18, R19 and R20, which may be identical or different, are each a hydrogen atom, a lower alkyl radical, an alkenyl radical, a mono- or polyhydroxyalkyl radical, an aryl radical, an optionally substituted aralkyl radical or a radical —(CH2)n—R24, wherein n and R24 are as defined below;
- R21 and R22, which may be identical or different, are each an alkenyl radical, a mono- or polyhydroxyalkyl radical, an aryl radical, an optionally substituted aralkyl radical, or a radical —(CH2)n—R24, wherein n and R24 are as defined below;
- R23 is a lower alkyl radical;
- R24 is a heterocycle, a monohydroxyalkyl radical, a thiol radical optionally substituted with a lower alkyl radical, an amino radical optionally substituted with at least one lower alkyl radical, a radical —COOR25, or a radical —CON(R26)R27, wherein R25, R26 and R27 are as defined below;
- R25 is a hydrogen atom or a lower alkyl radical;
- R26 and R27, which may be identical or different, are each a hydrogen atom, a lower alkyl radical, or an optionally substituted aryl radical, with the proviso that R26 and R27 may together form, with the nitrogen atom from which they depend, a nitrogenous heterocycle;
- n is an integer such that 2≦n≦9;
- with the further provisos that, when Ar1 is the radical of formula (c) and X is a radical of formulae (i) or (j), then R11 is a radical —OR21 or a polyether radical, or when Ar2 is the radical of formula (d), then R12 is a radical —OR22 or a polyether radical, and the compounds of formula (I) do not include those wherein R11 is a methoxymethoxy radical in an ortho position relative to the substituent Ar2 when Ar1 is the radical of formula (c), X is the radical of formula (i), R12 is hydrogen and R1 is a radical —COR3 wherein R3 is a radical —OR17 and R17 is a hydrogen atom, and those wherein R12 is a methoxymethoxy radical in an ortho- or para-position relative to the substituent Ar1 when Ar1 is the radical of formula (c), X is the radical of formula (i), R11 is a methyl radical in an ortho-position relative to Ar2, and R1 is a radical —COR3 wherein R3 is a radical —OR17 and R17 is a hydrogen atom;
- and the pharmaceutically/cosmetically acceptable optical and geometric isomers and salts thereof, wherein said compound is an RXR antagonist.
Dependencies are inferred from the claim text.