Method and apparatus for liquid-treating and drying a substrate

A method for removing liquid from at least one flat surface of a substrate, said method comprising the steps of:

• introducing said substrate in a tank;
• filling said tank with a liquid;
• performing at least one liquid treatment step on said substrate;
• removing said substrate from said tank in an essentially vertical direction, said direction being parallel to said substrate surfaces that are to be dried, through an opening in a top part of said tank, so that a liquid flow out of said tank is produced between said substrate and said opening during the passage of said substrate through said opening;
• and
• directing a flow of a gaseous substance at an intersection line between said substrate surface that is to be dried and said liquid, in such a way that a plane comprising both the speed vector of the substrate movement and of said flow of a gaseous substance is perpendicular to said surface of said substrate that is to be dried, the step of directing a flow of a gaseous substance being performed simultaneously with said step of removing said substrate.

A method for removing liquid from at least one surface of a substrate, said method comprising the steps of:

• introducing said substrate in a tank;
• filling said tank with a liquid, the liquid having a liquid surface;
• performing at least one liquid treatment step on said substrate;
• and
• lowering surface tension at at least a part of the liquid surface;
• removing said substrate from said tank in an essentially vertical direction, said direction being parallel to said substrate surfaces that are to be dried, through an opening in the top part of said tank, so that a liquid flow out of said tank is produced between said substrate and said opening during the passage of said substrate through said opening,
• wherein the step of lowering said surface tension is performed, at least a part of time, simultaneously with the step of removing said substrate from said tank.

A method for removing liquid from at least one surface of a substrate, said method comprising the steps of:

• introducing said substrate in a tank;
• filling said tank with a liquid;
• performing at least one liquid treatment step on said substrate;
• removing said substrate from said tank in an essentially vertical direction, said direction being parallel to said substrate surfaces that are to be dried, through an opening in the top part of said tank, so that a liquid flow out of said tank is produced between said substrate and said opening during the passage of said substrate through said opening;
• and
• directing a heat supply at the intersection line between a substrate surface that is to be dried, and said liquid, said heat supply being produced along a line perpendicular to the substrate movement, in such a way that the same heat is produced in every point of said line, the step of directing a heat supply being performed simultaneously with said step of removing said substrate.

A method for removing liquid from at least one surface of a substrate, said method comprising the steps of:

• introducing said substrate in a tank;
• filling said tank with a liquid, the liquid having a liquid surface;
• lowering surface tension at at least a part of the liquid surface;
• and
• removing said substrate from said tank in an essentially vertical direction, said direction being parallel to said substrate surfaces that are to be dried, through an opening in a top part of said tank, so that a liquid flow out of said tank is produced between said substrate and said opening during the passage of said substrate through said opening,
• wherein the step of lowering said surface tension is performed, at least a part of time, simultaneously with the step of removing said substrate from said tank.