Method of fabricating row lines of a field emission array and forming pixel openings therethrough

A method for fabricating an anode for at least one emitter tip, comprising:

• forming a conductive layer over a semiconductive layer comprising at least one pixel opening
• positioned over the at least one emitter tip;
• forming a passivation layer over said conductive layer;
• and
• forming a mask over said passivation layer, said mask being configured to facilitate removal of
• portions of said passivation layer and said conductive layer located laterally adjacent to
• the at least one emitter tip and over said at least one pixel opening.

A method for fabricating an anode for at least one emitter tip, comprising:

• forming a first layer comprising conductive material over a semiconductive layer located above
• the at least one emitter tip;
• forming a second layer comprising passivation material over said first layer;
• forming a first mask over said second layer, an aperture of said first mask being positioned and
• configured to facilitate the formation of at least one pixel opening through said first and second layers;
• removing regions of said first and second layers to form said at least one pixel opening;
• forming a second mask over said second layer to shield said at least one pixel opening, said
• second mask being configured to facilitate removal of material laterally adjacent to the at least one emitter tip;
• and
• removing regions of said second layer, said first layer, and said semiconductor layer with said second mask.