Chemically amplified positive resist composition
AssigneeSumitomo Chemical Company, Limited
InventorsYasunori Uetani, Seong-Hyeon Kim
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AssigneeSumitomo Chemical Company, Limited
InventorsYasunori Uetani, Seong-Hyeon Kim
Estimating the term…
A chemically amplified positive resist composition is provided which is excellent in sensitivity and resolution; and comprises a resin (X) which, per se, is insoluble or slightly soluble in alkali but becomes soluble in alkali by the action of acid, and has a polymeric unit (a) derived from an alicyclic unsaturated carboxylic acid ester in which a carboxylic acid ester group represented by the formula (I): wherein R1 represents an alkyl having 1 to 4 carbon atoms, R represents an alicyclic hydrocarbon residue which may be optionally substituted with a group selected from hydroxyl and oxo, and R2 represents an alkyl having 1 to 4 carbon atoms, or R and R2, together with carbon atoms to which R2 and R are bonded, form a ring, is bonded to an alicyclic hydrocarbon having a polymerizable carbon-carbon double bond in its ring; and a polymeric unit (b) derived from maleic anhydride; and an acid-generating agent (Y).
A chemically amplified positive resist composition which comprises a resin (X) which is insoluble or slightly soluble in alkali but becomes soluble in alkali by the action of acid, and has a polymeric unit (a) derived from an alicyclic unsaturated carboxylic acid ester in which a carboxylic acid ester group represented by the formula (I):
Dependencies are inferred from the claim text.