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US 6,632,512 B1Granted
Ceramic substrate
AssigneeIbiden Co., Ltd.
InventorYasutaka Ito
Life of this patent
Estimating the term…
Abstract
The present invention provides a ceramic substrate for use in an apparatus for manufacturing and inspecting semiconductors. The ceramic substrate comprises a through-hole having excellent tolerance performance against a drawing stress applied to an external terminal pin. The through-hole is provided with a projection which protrudes into the ceramic substrate made of aluminum nitride as primary component.
Claims4
A ceramic heater for use in the manufacture and inspection processes of semiconductors, comprising:
- a circular ceramic substrate;
- a heat-generation pattern inside said circular ceramic substrate;
- and
- at least one conductive through-hole connected electrically to said heat-generation pattern, wherein at least one projection is formed on a side wall of each of the at least one conductive through-hole so as to protrude into said circular ceramic substrate, and a heating surface for a wafer is existent on the through-hole.
1 more element
Dependencies are inferred from the claim text.