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US 6,632,325 B2Granted
Article for use in a semiconductor processing chamber and method of fabricating same
AssigneeApplied Materials, Inc.
InventorRamkishan Rao Lingampalli
Life of this patent
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AssigneeApplied Materials, Inc.
InventorRamkishan Rao Lingampalli
Estimating the term…
An article having a protective coating for use in semiconductor applications and method for making the same is provided. In one embodiment, a method of coating an aluminum surface of an article utilized in a semiconductor deposition chamber includes the steps of heating a coating material to a semi-liquidous state, the coating material comprising at least one material from the group consisting of aluminum fluoride and magnesium fluoride and depositing the heated coating material on the aluminum surface. The protective coating has a beta phase grain orientation of less than about 10 percent that has good adhesion to aluminum and resists cracking, flaking and peeling. Some articles that may be advantageously coated include showerheads, blocker plates, support assemblies and vacuum chamber bodies, among others.
A substrate support having an aluminum surface coated with aluminum fluoride, said aluminum fluoride coating applied by a method comprising heating aluminum fluoride to a semi-liquidous state and applying the heated aluminum fluoride to the aluminum surface.
A substrate support having an aluminum surface coated with aluminum fluoride, said aluminum fluoride coating applied by a method comprising:
A substrate support comprising:
A substrate support comprising:
Dependencies are inferred from the claim text.