Detection of residual cleaning product with analyzable surfactant

A method of cleaning a residue from a surface, comprising:

• (a) cleaning the surface with a cleaning composition which contains a detectable substance which is stable in the cleaning composition, the detectable substance includes a surfactant, the surfactant being one which is detectable at a concentration of 10 ppm or below;
• (b) rinsing the surface to remove the cleaning composition to produce a rinsate;
• and
• (c) analyzing the rinsate for the detectable substance by an analytical method selected from the group consisting of high performance liquid chromatography, UV/visible spectroscopy, electrochemical methods, fluorescence, and combinations thereof.

A method of cleaning a residue from a surface, comprising:

• (a) cleaning the surface with a cleaning composition which contains stable surfactant, the stable surfactant including a phosphate ester of the general formula:
• where
• x is RO(CH2CH2O)n or OM,
• M is an alkali metal,
• R includes an alkyl or phenyl group, and
• n is from 2 to 10;
• (b) rinsing the surface to remove the cleaning composition to produce a rinsate;
• and
• (c) analyzing the rinsate for the phosphate ester by an analytical method selected from the group consisting of high performance liquid chromatography, UV/visible spectroscopy, electrochemical methods, fluorescence, and combinations thereof.

A method of cleaning a residue from a surface, comprising:

• (a) cleaning the surface with a cleaning composition which includes, in terms of weight percent:
• sodium gluconate 3-8;
• potassium hydroxide 18-25;
• sodium EDTA 2-5;
• polyacrylic acid 0.1-2;
• an aromatic phosphate ester 0.2-1;
• and water Q.S.
• (b) rinsing the surface to remove the cleaning composition to produce a rinsate;
• and
• (c) analyzing the rinsate for residual aromatic phosphate ester by a method which is capable of detecting the surfactant at concentration of 10 ppm or less to determine whether the residual aromatic phosphate ester is above a preselected level.

A method of cleaning a residue from a surface, comprising:

• (a) cleaning the surface with a cleaning composition which contains a spectroscopically detectable substance which is stable in the cleaning composition, the spectroscopically detectable substance including a surfactant;
• (b) rinsing the surface to produce at least one rinsate;
• and
• (c) spectroscopically analyzing a rinsate from the surface at a first selected wavelength to determine whether a preselected component of the residue is above a minimum preselected level;
• and
• (d) spectroscopically analyzing the rinsate at a second selected wavelength to determine whether the spectroscopically detectable substance in the cleaning composition is above a minimum preselected level.

A method of cleaning a residue from a surface, comprising:

• (a) contacting the surface with a cleaning composition comprising a surfactant, the surfactant being one which is stable in the cleaning composition and which is detectable at a concentration of 10 ppm or less by high performance liquid chromatography (HPLC);
• (b) rinsing the surface to remove the cleaning composition to produce a rinsate;
• and
• (c) analyzing the surfactant in the rinsate by HPLC to determine whether the cleaning composition has been removed from the surface to at least a preselected acceptable level.