Programmable flux gradient apparatus for co-deposition of materials onto a substrate
AssigneeSymyx Technologies, Inc.
InventorsYouqi Wang, Xin Di Wu
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AssigneeSymyx Technologies, Inc.
InventorsYouqi Wang, Xin Di Wu
Estimating the term…
An apparatus for simultaneously depositing gradients components of two or more target materials onto a substrate is disclosed. The apparatus comprises a first target material source that directs a first target material towards the substrate and a second target material source that directs a second material towards the substrate. The apparatus further comprises a gradient shutter system that blocks a first predetermined amount of the first target material and a second predetermined amount of the second target material directed towards the substrate in order to generate gradients of the first and second target materials on the substrate. The gradients of the first and second target materials being simultaneously deposited onto the substrate to form a homogenous resulting material. A method for simultaneously depositing gradients of two or more target material onto a substrate is also disclosed.
A method for simultaneously depositing gradients of two or more target materials onto a substrate, the method comprising:
A method for forming one or more regions of a library on a substrate, the region of the library having a resulting material deposited in the region composed of two target materials, the method comprising:
A method for simultaneously depositing gradients of two or more target materials onto a substrate, the method comprising:
A method for forming one or more regions of a library on a substrate, the region of the library having a resulting material deposited in the region composed of two target materials, the method comprising:
Dependencies are inferred from the claim text.