Substrate processing apparatus and substrate processing method
AssigneeTokyo Electron Limited
InventorsJunichi Kitano, Yuji Matsuyama
Life of this patent
Estimating the term…
Abstract
On top of respective areas divided by partition plates, that is, a cassette station, a processing station, and an interface section in a coating and developing processing system, gas supply sections for supplying an inert gas into the respective areas are provided. Exhaust pipes for exhausting atmospheres in the respective areas are provided at the bottom of the respective areas. The atmospheres in the respective areas are maintained in a clean condition by supplying the inert gas not containing impurities such as oxygen and fine particles from the respective gas supply sections into the respective areas and exhausting the atmospheres in the respective areas from the exhaust pipes.
Claims17
A substrate processing apparatus for performing coating and developing processing for a substrate, comprising:
- a loader/unloader section for carrying the substrate into/out of the substrate processing apparatus;
- a processing section having a coating processing unit for at least forming a coating film on the substrate, a developing processing unit for developing the substrate, a thermal processing unit for thermally processing the substrate, and a first transfer device for carrying the substrate into/out of the coating processing unit, the developing processing unit, and the thermal processing unit;
- an interface section having a second transfer device for transferring the substrate at least via a route between the processing section and an aligner for subjecting the substrate to exposure processing;
- a first gas supply device for supplying an inert gas to the interface section;
- a first exhaust device for exhausting an atmosphere in the interface section;
- a second gas supply device for supplying the inert gas to the loader/unloader section;
- and
- a second exhaust device for exhausting an atmosphere in the loader/unloader section.
A substrate processing apparatus for performing coating and developing processing for a substrate, comprising:
- a loader/unloader section for carrying the substrate into/out of the substrate processing apparatus;
- a processing section having a coating processing unit for at least forming a coating film on the substrate, a developing processing unit for developing the substrate, a thermal processing unit for thermally processing the substrate, and a first transfer device for carrying the substrate into/out of the coating processing unit, the developing processing unit, and the thermal processing unit;
- an interface section having a second transfer device for transferring the substrate at least via a route between the processing section and an aligner for subjecting the substrate to exposure processing;
- a first gas supply device for supplying an inert gas to the interface section;
- a first exhaust device for exhausting an atmosphere in the interface section;
- and
- a first pressure regulating mechanism for setting a pressure inside the interface section lower than a pressure inside the aligner.
A substrate processing apparatus for performing coating and developing processing for a substrate, comprising:
- a loader/unloader section for carrying the substrate into/out of the substrate processing apparatus;
- a processing section having a coating processing unit for at least forming a coating film on the substrate, a developing processing unit for developing the substrate, a thermal processing unit for thermally processing the substrate, and a first transfer device for carrying the substrate into/out of the coating processing unit, the developing processing unit, and the thermal processing unit;
- an interface section having a second transfer device for transferring the substrate at least via a route between the processing section and an aligner for subjecting the substrate to exposure processing;
- a first gas supply device for supplying an inert gas to the interface section;
- a first exhaust device for exhausting an atmosphere in the interface section;
- and
- a pressure regulating mechanism for setting a pressure inside the substrate processing apparatus higher than a pressure outside the substrate processing apparatus.
A substrate processing apparatus for performing coating and developing processing for a substrate, comprising:
- a processing section having a coating processing unit for at least forming a coating film on the substrate, a developing processing unit for developing the substrate, a thermal processing unit for thermally processing the substrate, and a first transfer device for carrying the substrate into/out of the coating processing unit, the developing processing unit, and the thermal processing unit;
- an interface section having a second transfer device for transferring the substrate at least via a route between the processing section and an aligner for subjecting the substrate to exposure processing;
- a first gas supply device for supplying an inert gas to the interface section;
- and
- a first exhaust device for exhausting an atmosphere in the interface section;
- and
- a pressure regulating mechanism for setting a pressure inside the interface section lower than a pressure inside the aligner.
Dependencies are inferred from the claim text.