Apparatus and method for processing a substrate
AssigneeHitachi Electronics Engineering Co., Ltd.
InventorsKazuto Kinoshita, Kazuhiko Gommori, Kenya Wada
Life of this patent
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Abstract
A lamp house is located face to face with a substrate which is transferred by a conveyer means. A dielectric barrier discharge lamp is provided in the lamp house to irradiate the substrate with ultraviolet light, while a moistened inert gas, consisting of an inert gas and water vapor, is supplied to a space between the substrate and the dielectric barrier discharge lamp from a moistened inert gas generating means. Under irradiation of ultraviolet light from the dielectric barrier discharge lamp, water vapor in the moistened inert gas is split into a reducing active member [H·] and an oxidative active member [·OH].
Claims27
An apparatus for treating substrate surfaces, comprising:
- a conveyor means for conveying the substrate along a transfer path;
- a lamp house located over the conveyor means and configured to face the surface of the substrate transferred along said transfer path by the conveyor means;
- a dielectric barrier discharge lamp fixedly mounted in said lamp house and configured to irradiate ultraviolet light toward said substrate;
- and
- a moistened inert gas generating means for supplying a water vapor-containing moistened inert gas to a space between said substrate and said dielectric barrier discharge lamp;
- wherein the dielectric barrier discharge lamp is configured to irradiate the moistened inert gas with ultraviolet light to produce a reducing active member (H.) and an oxidative active member (.OH) to contact the surface of the substrate.
An apparatus for treating a surface of a substrate, comprising:
- a housing configured to face the surface of the substrate;
- a discharge lamp mounted in the housing;
- and
- a moistened inert gas generating means for supplying a moistened inert gas to a space between the substrate and the discharge lamp;
- wherein the discharge lamp is configured to irradiate the moistened inert gas with ultraviolet light to produce a reducing active member (H.) and an oxidative active member (.OH) to contact the surface of the substrate.
Dependencies are inferred from the claim text.