US 6,631,547 B2Granted

Manufacturing method for thin film magnetic heads

AssigneeHitachi, Ltd.

InventorsMinoru Yoshida, Hideaki Sasazawa, Toshihiko Nakata, Minoru Yamasaka

Life of this patent

Estimating the term…

Loading patent…

Abstract

To measure positions of a plurality of thin film magnetic head elements formed in a line on a bar, the quantity of positions of samples in the bar is estimated from the magnetic head elements the amount of deviation in position of the next element, and the distance between the elements are obtained, and the amount of deviation and distance are estimated by a primary approximate linear or several-order approximate curve. The estimated amount and the distance between the elements are moved simultaneously, and an image formed by a lens optical system is photo-converted to an image signal, and dimensions are computed. The conversion step is carried out immediately after movement of the next element and is continuously repeated, and the computing step is processed in parallel with the conversation step.

Claims5

Dependent claims

A manufacturing method for a thin film magnetic head comprising the steps of:

forming a plurality of thin film patterns corresponding to a plurality of thin film magnetic head elements on a substrate;
cutting the substrate formed with the plurality of thin film patterns to cut out a group of thin film magnetic head elements;
measuring dimensions of a predetermined part of the thin film patterns for the group of thin film magnetic head elements separated;
selecting a group of thin film magnetic head elements as acceptable, based on a result of measurement;
and
feeding the group of acceptable thin film magnetic head elements selected to a subsequent step;
wherein in the step of measuring dimensions, images of each said thin film magnetic head element are sequentially picked up by sequentially moving said thin film magnetic head elements along a longitudinal direction of said thin film magnetic head elements with a constant pitch and in a Y direction perpendicular to the longitudinal direction over a distance which is estimated by using information of a previously measured value of said predetermined part of the thin film patterns.

4 more elements

Dependencies are inferred from the claim text.

Facts

Application: 09/778,776Filed 8 Feb 2001
Priority: JP 00-28523214 Sep 2000
Published: US 2002/0029459 A114 Mar 2002
Granted: 14 Oct 2003
Term ends: Not estimatedThe source records don’t support an estimate.

Classification14 codes

G11B 5/3173
Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional…:…
B82Y 10/00
Nanotechnology for information processing, storage or transmission
B82Y 25/00
Nanomagnetism
G11B 5/3166
Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional…:…