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US 6,630,520 B1Granted
Composition containing a cross-linkable matrix precursor and a poragen, and a porous matrix prepared therefrom
AssigneeDow Global Technologies LLC
InventorsKenneth J. Bruza, James P. Godschalx, Edward O. Shaffer, II, Dennis W. Smith, Jr., Paul H. Townsend, III, Kevin J. Bouck, Qing Shan J. Niu
Life of this patent
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Abstract
A suitable cross-linkable matrix precursor and a poragen can be treated to form a porous cross-linked matrix having a Tg of greater than 300° C. The porous matrix material has a lower dielectric constant than the corresponding non-porous matrix material, making the porous matrix material particularly attractive for a variety of electronic applications including integrated circuits, multichip modules, and flat panel display devices.
Claims18
A composition comprising:
- a) a hydrocarbon-containing matrix precursor;
- and b) a poragen;
- wherein the matrix precursor comprises a material selected from cyclopentadienone and acetylene functional compounds, at least some of which have three or more reactive functional groups;
- partially polymerized reaction product of cyclopentadienone and acetylene functional compounds, at least some of which have three or more reactive functional groups;
- perfluoroethylene compounds having functionality of three or more;
- and a partially polymerized product of perfluoroethylene compounds having functionality of three or more.
3 more elements
Dependencies are inferred from the claim text.