Run-to-run control over semiconductor processing tool based upon mirror image target

An apparatus for processing a substrate, said apparatus comprising:

• a substrate processing station;
• a sensor operatively coupled to said substrate processing station to detect a sensed result from the substrate;
• a computer processor controlling an operational parameter for the operation of said apparatus;
• and
• a memory coupled to said computer controller, said memory storing a computer program in computer readable format including computer instructions to control said apparatus to,
• a) provide a goal of a process result sought to be produced by the tool,
• b) detect an actual output of the process result from a most recent run of the tool according to an initial recipe,
• c) calculate a difference by subtracting the goal from the actual output
• d) calculate a mirror image target by adding the difference to the goal,
• e) generate a suggested recipe from the minor image target by generating a subset of process results and corresponding operational parameters from a data library based upon a K-nearest neighbor similarity with the mirror image target, by,
• comparing the mirror image target with the data library of prior process results and corresponding operational parameters,
• generating the subset of process results and corresponding operational parameters from the data library based upon a K-nearest neighbor similarity with the mirror image target, and
• combining the operational parameters of the subset to produce the suggested recipe;
• and
• f) perform a subsequent run of the tool utilizing the suggested recipe to produce a second actual output of the process result that is similar to the goal.