Nitrogen analogs of copper II β-diketonates as source reagents for semiconductor processing
AssigneeApplied Materials, Inc.
InventorsLing Chen, Barry Chin
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Abstract
Nitrogen containing analogs of Copper II β-diketonates which analogs are more stable source reagents for copper deposition when substantially free of solvents of excess ligands. The nitrogen containing analogs replace —O— with —N(R″)— wherein R″ is an alkyl group having from one to four carbon atoms. Replacement of each —O— is preferred although replacement of one —O— per cyclic ring is sufficient to improve stability of the copper source reagents. The source reagent can be purified by sublimation to remove solvents and excess ligands prior to semiconductor processing.
Claims10
A source reagent having the structure of FIG. 1 or FIG. 2, wherein R and R′ are hydrogen and R″ is an alkyl group having from one to four carbon atoms, wherein the source reagent is substantially free of solvents and excess ligands.
A source reagent having the structure of FIG. 1, wherein R and R′ are hydrogen and the source reagent is purified by sublimation.
A source reagent having the structure of FIG. 2, wherein the source reagent is purified by sublimation.
A method for making a source reagent of FIG. 1 or FIG. 2 wherein R and R′ are hydrogen and R″ is an alkyl group having from one to four carbon atoms, comprising sublimation of the source reagent to remove solvents or excess ligands prior to semiconductor processing.
Dependencies are inferred from the claim text.