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US 6,618,119 B2Granted
Projection exposure method and apparatus
AssigneeNikon Corporation
InventorKazuaki Suzuki
Life of this patent
Estimating the term…
Abstract
A scanning exposure method includes relatively moving a mask and an illuminated area of an exposure beam during a scanning exposure, an image of a pattern of said mask being projected onto a substrate through a projection system; and performing, during the scanning exposure, an imaging adjustment in order to compensate for change of the image projected onto the substrate that would be caused by a scanning error of the mask, the scanning error causing a positional variation of a pattern surface of the mask along an axis of the projection system.
Claims9
A scanning exposure method comprising:
- relatively moving a mask and an illuminated area of an exposure beam during a scanning exposure, an image of a pattern of said mask being projected onto a substrate through a projection system;
- and
- performing, during the scanning exposure, an imaging adjustment in order to compensate for change of the image projected onto the substrate that would be caused by a scanning error of the mask, the scanning error causing a positional variation of a pattern surface of the mask along an axis of the projection system.
Dependencies are inferred from the claim text.