Optimized curvilinear variable axis lens doublet for charged particle beam projection system
AssigneeNikon Corporation
InventorWerner Stickel
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AssigneeNikon Corporation
InventorWerner Stickel
Estimating the term…
This is a method for designing an optimized charged particle beam projection system. Specify lens configuration and first order optics. Calculate lens excitations. Configure the lens system, providing lens field distributions, beam landing angle, and imaging ray/axis cross-over. Provide an input deflector configuration. Solve a linear equation set, and thereby provide a curvilinear axis and associated deflection field distributions. Calculate the third order aberration coefficients yielding a list of up to 54 aberration coefficients. Provide an input of dynamic correctors. Calculate excitations to eliminate quadratic aberrations in deflection. Calculate third and fifth order aberrations, providing image blur and distortion vs. deflection, best focal plane, and depth of focus. Determine whether the current result is better than the previous result. If YES then change the axial location input to the solve linear equation set. If NO, test whether the current result is acceptable. If NO, provide a deflector configuration. If YES, test whether the deflection current is larger. If YES, change the input for the axial location of the deflectors to solve the linear equation set again. If NO then END the process.
A method of optimizing the parameters of a charged particle beam projection system comprising the steps as follows:
A method of making an optimized charged particle beam projection system with a lens system comprising a telecentric antisymmetric doublet comprising the steps as follows:
Dependencies are inferred from the claim text.