Exposure method
AssigneeSharp Kabushiki Kaisha
InventorsYasunori Nishimura, Taimi Oketani, Tsuyoshi Naraki
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Abstract
The present invention aims at reducing the number of scanning exposure and at enhancing throughput. the above-mentioned objective is achieved by allowing a substrate 14 to be placed in sideways with respect to a substrate holder 15a (placing the longer sides of the substrate in parallel to the shorter sides of the substrate holder) depending on the size of the apparatus and the size of the substrate 14. It is acceptable even when areas other than an effective exposure area of the substrate 14 should project out from the substrate holder.
Claims5
An exposure method for exposing a rectangular substrate to a pattern of a mask by transferring a mask stage carrying a mask formed with the pattern and a rectangular substrate holder carrying the substrate in a first direction, the method comprising the steps of:
- placing the substrate whose longer sides are longer than the shorter sides of the substrate holder, on the substrate holder such that the longer sides of the substrate are generally arranged along the shorter sides of the substrate holder;
- exposing a first area of the substrate to the pattern of the mask by transferring the mask stage and the substrate holder in the first direction;
- transferring the substrate holder in a second direction which is generally perpendicular to the first direction;
- and
- exposing a second area of the substrate, which is adjacent to the first area along the second direction, by transferring the mask stage and the substrate holder in the first direction.
Dependencies are inferred from the claim text.