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US 6,617,082 B2Granted
Microelectromechanical system mask
AssigneeIntel Corporation
InventorJohn Hutchinson
Life of this patent
Estimating the term…
Abstract
The present invention discloses a microelectromechanical system mask with an array of reflectors, each reflector having two mirrors separated from each other by an adjustable gap.
Claims19
A mask comprising:
- a plurality of reflectors, each reflector comprising:
- a gap
- a first mirror disposed above said gap;
- and
- a second mirror disposed below said gap.
2 more elements
A mask comprising:
- an array of reflectors, each reflector comprising:
- a lower mirror;
- an upper mirror suspended over said lower mirror;
- and
- a means for moving said upper mirror.
2 more elements
An apparatus comprising:
- an illumination source adapted to provide light energy;
- an optical package adapted to transfer said light energy;
- and
- a mask adapted to receive said light energy, said mask comprising:
- an array of reflectors, each reflector comprising:
- a lower mirror
- an upper mirror separated from said lower mirror by a gap;
- and
- a driver adapted to adjust said gap to vary said reflector between a reflective state and an anti-reflective state.
6 more elements
Dependencies are inferred from the claim text.