Procedure and device for specific particle manipulation and deposition
AssigneeMax-Planck-Gesellschaft zur Forderung der Wissenschaften e.V.
InventorsGregor Morfill, Hubertus Thomas, Timo Stuffler, Uwe Konopka
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Abstract
A process for manipulating particles distributed substantially non-uniformly in a plasma of a carrier or reaction gas, wherein Coulomb interaction between the particles is so low that the particles substantially do not form a plasmacrystalline state, and the particles are exposed in a location-selective manner to external adjustment forces and/or the plasma conditions are subjected to a location-selective change to apply at least a portion of the particles onto a substrate surface mask-free and/or subject it to a location-selective plasma treatment in the carrier or reaction gas.
Claims12
A process for manipulating particles in a plasma of a carrier gas or reaction gas within a reactor vessel having high frequency electrodes and a substrate arranged between said electrodes comprising:
- distributing the particles substantially non-unifonnly as a non-uniform spatial particle distribution in the plasma, wherein Coulomb interaction between the particles is so low that the particles substantially do not form a plasma crystalline state, the particle distribution being held in a balance between gravitational and electrical forces and the substrate being arranged between the particle distribution and one of the electrodes,
- modifying the shape of the particle distribution by location-selective effecting the balance between gravitational forces and electrical forces, and
- arranging and adhering at least a portion of the particles from the modified particle distribution on the substrate by one or more selected from influencing the electrical forces, exerting external adjustment forces holding the particles, moving the substrate and modifyiing plasma conditions in the vessel.
A process for manipulating particles in a plasma of a carrier gas or reaction gas within a reactor vessel having high frequency electrodes comprising:
- distributing the particles substantially non-uniformly as a non-uniform spatial particle distribution in the plasma, wherein Coulomb interaction between the particles is so low that the particles substantially do not form a plasma crystalline state, the particle distribution being held in a balance between gravitational and electrical forces,
- moving a predetermined portion of the particle distribution to a treatment position by location-selective effecting the balance between gravitational forces and electrical forces, by exerting external adjustment forces or by modifying the plasma conditions, and
- subjecting the particles in the treatment position to a plasma treatment comprising a particle surface coating or ablation.
Dependencies are inferred from the claim text.