Processing apparatus with pressure control and gas recirculation system

A processing apparatus comprising:

• a sealed vacuum chamber which contains a processing portion;
• a pressure controlling system, connected to said sealed vacuum chamber, which keeps the internal pressure of said sealed vacuum chamber constant at a predetermined level by exhausting the ambient gas from said sealed vacuum chamber;
• an ambient gas recirculating system, connected to said pressure controlling system and to said sealed vacuum chamber, which recirculates the ambient gas exhausted from said sealed vacuum chamber through the pressure controlling system back into said sealed vacuum chamber;
• and
• a high pressure gas recirculating system, connected to said pressure controlling system and to said sealed vacuum chamber, which increases the pressure of the ambient gas exhausted from said sealed vacuum chamber and which recirculates the ambient gas having a high pressure into said sealed vacuum chamber;
• wherein during operation of said processing apparatus and upon cessation of said operation, at least a portion of the ambient gas is stored in at least said ambient gas recirculating system or said high pressure ambient gas recirculating system or both.

A processing apparatus comprising:

• a sealed vacuum chamber which contains a processing portion;
• an exhausting device, connected to said sealed vacuum chamber, for exhausting ambient gas from said sealed vacuum chamber;
• an ambient gas recirculating system, connected to said exhausting device and to said sealed vacuum chamber, which recirculates the ambient gas exhausted from said sealed vacuum chamber through said exhausting device back into said sealed vacuum chamber;
• a high pressure ambient gas recirculating system, connected to said exhausting device and to said sealed vacuum chamber, which increases the pressure of the ambient gas exhausted from said sealed vacuum chamber, through said exhausting device and which recirculates the ambient gas having an increased pressure to said sealed vacuum chamber;
• and
• a pressure control device, connected to said exhausting device and to said sealed vacuum chamber, which keeps the internal pressure of said sealed vacuum chamber constant at a predetermined level.

A processing apparatus comprising:

• a sealed vacuum chamber which contains a processing portion;
• a pressure controlling system, connected to said sealed vacuum chamber, which keeps the internal pressure of said sealed vacuum chamber constant at a predetermined level by exhausting ambient gas from said sealed vacuum chamber;
• an ambient gas recirculating system, connected to said pressure controlling system and to said sealed vacuum chamber, which recirculates the ambient gas exhausted from said sealed vacuum chamber through said pressure controlling system back into said sealed vacuum chamber;
• and
• a high pressure ambient gas recirculating system, connected to said pressure controlling system and to said sealed vacuum chamber, which increases the pressure of the ambient gas exhausted from said sealed vacuum chamber through said pressure controlling system and which recirculates the ambient gas having an increased pressure to said sealed vacuum chamber;
• wherein a substrate is exposed in said sealed vacuum chamber.

A processing apparatus comprising:

• a sealed vacuum chamber which contains a processing portion;
• a pressure controlling system, connected to said sealed vacuum chamber, which keeps the internal pressure of said sealed vacuum chamber constant at a predetermined level by exhausting the ambient gas from said sealed vacuum chamber;
• an ambient gas recirculating system, connected to said pressure controlling system and to said sealed vacuum chamber, which recirculates the ambient gas exhausted from said sealed vacuum chamber through said pressure controlling system back into said sealed vacuum chamber;
• and
• a high pressure gas recirculating system, connected to said pressure controlling system and to said sealed vacuum chamber, which increases the pressure of the ambient gas exhausted from said sealed vacuum chamber and which recirculates the ambient gas having a high pressure into said sealed vacuum chamber;
• wherein during operation of said processing apparatus and upon cessation of said operation, at least a portion of the ambient gas is stored in at least said ambient gas recirculating system or said high pressure ambient gas recirculating system or both;
• and
• wherein a substrate is exposed in said sealed vacuum chamber.

A processing apparatus comprising:

• a sealed vacuum chamber which contains a processing portion;
• an exhausting device, connected to said sealed vacuum chamber, for exhausting ambient gas from said sealed vacuum chamber;
• an ambient gas recirculating system, connected to said exhausting device and to said sealed vacuum chamber, which recirculates the ambient gas exhausted from said sealed vacuum chamber through said exhausting device back into said sealed vacuum chamber;
• a high pressure ambient gas recirculating system, connected to said exhausting device and to said sealed vacuum chamber, which increases the pressure of the ambient gas exhausted from said sealed vacuum chamber, through said exhausting device and which recirculates the ambient gas having an increased pressure to said sealed vacuum chamber;
• and
• a pressure control device, connected to said exhausting device and to said sealed vacuum chamber, which keeps the internal pressure of said sealed vacuum chamber constant at a predetermined level;
• wherein a substrate is exposed in said sealed vacuum chamber.