Substrate processing device and method
AssigneeAnelva Corporation
InventorJunro Sakai
Life of this patent
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Abstract
A substrate processing device in which a film is formed on a substrate while a magnetic field, by a magnet arranged in the periphery of a substrate holder, is imparted on to the surface of a substrate mounted on the substrate holder while the substrate holder is rotated, wherein a rotation mechanism for the magnet and a rotation mechanism for the substrate holder are independently provided and controlled and, furthermore, in that it is provided with a device for detection of the magnetic field orientation, a device for detection of the prescribed orientation of the substrate, and a mechanism which, using the output of said two detection devices, affords rotation in which the prescribed direction of the substrate and the direction of the magnetic field are aligned within a prescribed angle.
Claims22
A substrate processing device for forming a film on a surface of a substrate, the substrate processing device comprising:
- a substrate holder;
- a magnet deployed in a periphery of the substrate holder so as to impart a magnetic field on to the surface of a substrate mounted on the substrate holder;
- a substrate holder rotation mechanism;
- and
- a magnet rotation mechanism;
- wherein the magnet rotation mechanism and the substrate rotation mechanism are configured so as to be able to be rotated independently of each other, and the substrate holder rotation mechanism is controlled independently of the magnet rotation mechanism.
A substrate processing device for forming a film on a surface of a substrate, the substrate processing device comprising:
- a substrate holder;
- a magnet deployed in a periphery of the substrate holder so as to impart a magnetic field on to the surface of a substrate mounted on the substrate holder;
- a substrate holder rotation mechanism;
- a magnet rotation mechanism that is rotatable independently of the substrate holder rotation mechanism;
- a first detector for detecting an orientation of the magnet;
- a second detector for detecting an orientation of the substrate;
- and
- a control device for controlling rotation of the substrate holder rotation mechanism and the magnet rotation mechanism so that a substrate on the substrate holder and the magnet are aligned with each other within a prescribed angle.
A substrate processing method in which a film is formed on a substrate while a magnetic field, generated by a magnet deployed in a periphery of a substrate holder, is imparted on to a surface of the substrate mounted on said substrate holder while said substrate holder is rotated, comprising the steps of:
- continuously maintaining the magnet in a rotation state and, when the substrate is to be exchanged, stopping only the rotation of the substrate holder and, rotating the substrate holder again and when a direction of the magnetic field and a prescribed direction of the substrate are within a prescribed angle, the rotation parts of the magnet and the abovementioned substrate holder are brought into contact to afford the integral rotation of the magnet and substrate holder, following which the forming of the film is performed.
A substrate processing method, comprising the steps of:
- continuously rotating a magnet in a periphery of a substrate holder to create a magnetic field;
- placing a substrate on the substrate holder while the substrate holder is stationary and the magnet is rotating;
- rotating the substrate holder to the same rate of revolution as the magnet;
- bringing an orientation of the substrate holder and the magnet into alignment with each other;
- engaging the substrate holder and the magnet with each other to enable the substrate holder and magnet to rotate in unison;
- forming a film on the substrate while the substrate holder and magnet are rotating in unison;
- disengaging the substrate holder and magnet from each other;
- stopping rotation of the substrate holder while continuing rotation of the magnet;
- and
- removing the substrate from the substrate holder.
Dependencies are inferred from the claim text.