Polishing cloth and method for attaching/detaching the polishing cloth to/from polishing machine base plate

A polishing cloth comprising:

• a polishing cloth substrate;
• a first pressure-sensitive adhesive layer formed on a back face of the polishing cloth substrate;
• a support formed on a back face of the first pressure-sensitive adhesive layer;
• a second pressure-sensitive adhesive layer formed on a back face of the support;
• and
• a release sheet releasably attached to the second pressure-sensitive adhesive layer,
• wherein the second pressure-sensitive adhesive layer comprises an adhesive composition,
• the adhesive composition containing a pressure-sensitive adhesive and a side-chain crystallizable polymer so that the side-chain crystallizable polymer is present in an amount of about 1% to about 30% by weight based on the adhesive composition, and
• the side-chain crystallizable polymer including as a main component thereof an acrylic acid ester and/or methacrylic acid ester which has a straight-chain alkyl group including 16 or more carbon atoms as a side chain,
• wherein the adhesive composition contains a tackifier in an amount of about 10% to about 30% by weight,
• wherein the side-chain crystallizable polymer has a molecular weight of about 2,000 to about 15,000, and
• wherein adhesiveness of the adhesive composition, measured by a peeling force, is decreased by more than about 90% when heated above about 50° C., with respect to the adhesiveness when measured at 23° C.