Spatter ion pump
AssigneeUlvac, Inc.
InventorGuo Hua Shen
Life of this patent
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AssigneeUlvac, Inc.
InventorGuo Hua Shen
Estimating the term…
The sputter ion pump includes a vacuum chamber that includes an inner wall having a cylindrical section which is rugged in cross section. The rugged cylindrical section has outer recesses each of which is provided with a permanent magnets, each magnet having a same shape and a same characteristic so that a magnetic pole is directed to a same direction. The rugged cylindrical section has also inner recesses each of which is provided with a cylindrical anode electrode member spaced from the vacuum chamber wall. The rugged cylindrical section of the vacuum chamber wall is formed as a cathode electrode. A cylindrical shield member having a peripheral portion provided with evacuating bores is provided coaxially to the permanent magnets and anode electrodes. The permanent magnets and anode electrode members are arranged with equal spacing in an axis symmetrical configuration.
A sputter ion pump comprising an anode electrode and a cathode electrode arranged within a vacuum chamber, in which said vacuum chamber high voltage is applied between the anode and cathode electrode so that (a) electrons are spirally moved by means of a magnetic field, (b) residual gas molecules in the vacuum chamber are collided with electrons that are spirally moving and are ionized, (c) the ionized molecules sputter the cathode electrode to activate surfaces thereof, and (d) thus the surfaces of the cathode electrode which are activated and surfaces of the anode electrode adsorb or catch the gas molecules, thereby performing an evacuation,
Dependencies are inferred from the claim text.