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US 6,611,400 B1Granted
Texture structure for optimizing head disc interface
AssigneeSeagate Technology LLC
InventorsAndreas A. Polycarpou, Zine-Eddine Boutaghou, Daniel P. Burbank
Life of this patent
Estimating the term…
Abstract
A head disc interface having a fine pitch surface roughness including fine pitch projections having a relatively smooth roughness height and a projection pitch <1.0 μm for optimizing tribological performance.
Claims16
A head-disc interface for digital recording comprising:
- a data head including a transducer element;
- and
- at least one head disc interface surface having a fine pitch surface roughness including fine pitch projections having a relatively smooth roughness height having a roughness average Ra of approximately 1.0 nm or less, a projection pitch d of approximately <1.0 μm and a ratio of σ/R greater than or equal to approximately 1.0×10−5 where σ is a root mean square of the heights of the projections and R is an average value of a radius of curvature of projection summits which is a function of the projection height and the projection pitch.
A data head supporting a transducer for read or write operations comprising:
- a slider, including at least one transducer supported by the slider;
- and
- the slider including means for head-disc contact interface having a surface roughness characterized by fine pitch projections having a projection pitch d of approximately <1.0 μm, a relatively smooth roughness height having a roughness average Ra of approximately 1.0 nm or less and having a ratio σ/R greater than or equal to approximately 1.0×10−5 where σ is a root mean square of the heights of the projections and R is an average value of a radius of curvature of projection summits.
A head-disc interface for digital recording comprising:
- a data head including a transducer element;
- and
- at least one head disc interface surface having a fine pitch surface roughness including fine pitch projections having a relatively smooth roughness height having a roughness average Ra of approximately 1.0 nm or less and projection pitch of approximately d<1.0 μm, the fine pitch surface roughness characterized by a ratio σ/R greater than or equal to approximately 1.0×10−5 where σ is a root mean square of the heights of the projections and R is an average value of a radius of curvature of projection summits and the fine pitch surface roughness is formed using interference lithography.
Dependencies are inferred from the claim text.