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AssigneeHitachi, Ltd.
InventorsTatsuya Ohkubo, Genshiro Kawachi, Yoshiro Mikami, Kazuhito Masuda, Hiroshi Kageyama
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To prevent an n-channel thin-film transistor from being deteriorated by hot holes generated in a gate-negative pulse mode. A thin polysilicon film 10 is provided with a p-type semiconductor region 13 in contact with a channel region 14. The p-type semiconductor region 13 is electrically connected to nowhere except the channel region 14. Holes induced on the surface due to a gate-negative pulse are further supplied from the p-type semiconductor region 13. An electric field established by the gate-negative pulse is relaxed by the holes, fewer hot holes are injected into the gate oxide film, and the TFT characteristics are less deteriorated.
An n-channel insulated gate thin-film transistor using electrons as a main current carrier and comprising a semiconductor thin film formed on an insulating substrate and a gate electrode formed on said semiconductor thin film via a gate insulating film, said semiconductor thin film having a source region and a drain region which are n-type semiconductor regions formed therein sandwiching a channel region which is an intrinsic semiconductor region just under the gate electrode, wherein said semiconductor thin film has a p-type semiconductor region in contact with the channel region, and said p-type semiconductor region is electrically connected to nowhere except said channel region.
An n-channel insulated gate thin-film transistor using electrons as a main current carrier and comprising a gate electrode formed on an insulating substrate and a semiconductor thin film formed on said gate electrode via a gate insulating film, said semiconductor thin film having a source region and a drain region which are n-type semiconductor regions formed therein sandwiching a channel region which is an intrinsic semiconductor region just over the gate electrode, wherein said semiconductor thin film has a p-type semiconductor region in contact with said channel region, and said p-type semiconductor region is electrically connected to nowhere except said channel region.
An n-channel insulated gate thin-film transistor using electrons as a main current carrier and comprising an insulating film formed on a semiconductor substrate, a semiconductor thin film formed on said insulating layer and a gate electrode formed on said semiconductor thin film via a gate insulating film, said semiconductor thin film having a source region and a drain region which are n-type semiconductor regions formed therein sandwiching a channel region which is an intrinsic semiconductor region just under the gate electrode, wherein said semiconductor thin film has a p-type semiconductor region in contact with the channel region, and said p-type semiconductor region is electrically connected to nowhere except said channel region.
Dependencies are inferred from the claim text.